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Exhaust-gas treatment apparatus

A waste gas treatment device and a gas treatment technology, which are applied in gas treatment, exhaust devices, noise reduction devices, etc., can solve the problems of low decomposition performance of refractory gases, etc.

Active Publication Date: 2017-12-01
EBARA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this case, the generation of nitrogen oxides (NOx) can be suppressed, but the decomposition performance of refractory gases such as PFCs that require high-temperature flames decreases
In addition, since the flame is low temperature, there is a problem of CO generation

Method used

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Examples

Experimental program
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Effect test

Embodiment Construction

[0052] Below, refer to Figure 1 to Figure 6 Embodiments of the exhaust gas treatment device according to the present invention will be described. exist Figure 1 to Figure 6 In , the same reference numerals are attached to the same or corresponding constituent elements, and overlapping descriptions are omitted.

[0053] figure 1 It is a schematic sectional view which shows the structural example of the combustion chamber of the exhaust gas processing apparatus of this invention. The combustion chamber 1 is configured as a cylindrical container-shaped combustion chamber with one end (the upper end in the illustrated example) closed and the other end (the lower end in the illustrated example) opened. In the cylindrical container-shaped combustion chamber 1, fuel (fuel gas), combustion-supporting gas (oxygen-containing gas), and process gas (exhaust gas) are injected near the closed end. A pilot burner 2 for ignition is provided at the closed end of the combustion chamber 1 ...

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PUM

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Abstract

The present invention pertains to an exhaust-gas treatment apparatus which burns and detoxifies the exhaust gas discharged from a manufacturing apparatus or the like that manufactures a semiconductor device, a liquid crystal, an LED or the like. In the exhaust-gas treatment apparatus which burns and detoxifies treatment gas, a cylindrical combustion chamber (1) burning the treatment gas is equipped with a combustion nozzle (3A), a susceptible gas nozzle (3B), and a treatment gas nozzle (3C) which inject fuel, susceptible gas, and treatment gas in the tangential direction of the inner peripheral surface of the combustion chamber (1). The combustion nozzle (3A), the susceptible gas nozzle (3B), and the treatment gas nozzle (3C) are located in the same plane perpendicular to the axis of the combustion chamber (1).

Description

technical field [0001] The present invention relates to an exhaust gas treatment device for detoxifying exhaust gas discharged from manufacturing equipment for manufacturing semiconductor devices, liquid crystals, LEDs, etc. by burning it. Background technique [0002] Exhaust of silane gas (SiH 4 ) or halogen gas (NF 3 , ClF 3 , SF 6 , CHF 3 , C 2 f 6 , CF 4 ) containing harmful combustible gases, but such waste gas (processing gas) cannot be released directly into the atmosphere. Therefore, these exhaust gases are usually introduced into a detoxification device for oxidation and detoxification treatment based on combustion. As this treatment method, a combustion-type exhaust gas treatment device that performs exhaust gas treatment by forming a flame in a furnace using fuel gas is widely used. [0003] The combustion-type waste gas treatment device for the semiconductor industry and the liquid crystal industry mixes the fuel with a combustion-supporting gas (oxygen...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F23G7/06F23C3/00F23L1/00F23M5/08
CPCF23L1/00F23M5/08F23C3/00F23G7/06F23L7/002F23D14/24F23G5/32F23G2203/30F23G2204/103F23G2209/142F23L2900/07008F23G7/065F23G2209/14B01D2251/102B01D2257/20B01D2258/0216F01N3/24
Inventor 宫崎一知驹井哲夫筱原丰司柏木诚司
Owner EBARA CORP
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