Method for preparing ceramic film layer with high corrosion resisting and stress corrosion resisting performances
A technology of stress corrosion resistance and ceramic film layer, applied in the direction of surface reaction electrolytic coating, coating, anodizing, etc., can solve the problem of not greatly improving the corrosion resistance and stress corrosion performance of alloys, restricting the application of 7XXX series aluminum alloys, and alloy fractures Failure and other problems, to achieve the effect of improving charge migration resistance, facilitating industrial production and smooth surface
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Embodiment 1
[0017] (1) Configure the electrolyte. The concentration of the electrolyte is: sodium hexametaphosphate 25 g / L, potassium hydroxide 2 g / L, sodium tetraborate 6 g / L, EDTA 2 g / L, glycerin 12 g / L ;
[0018] (2) Micro-arc oxidation was performed on the cleaned aluminum alloy surface using a DC pulse micro-arc oxidation device with a current density of 10 A / dm 2 , the temperature was controlled at 20-30°C, and the constant-current micro-arc oxidation time was 15 min under constant stirring.
Embodiment 2
[0020] (1) Configure the electrolyte, the concentration of the electrolyte is: sodium hexametaphosphate 25 g / L, potassium hydroxide 3 g / L, sodium tetraborate 6 g / L, EDTA 2 g / L, glycerol 12 g / L ;
[0021] (2) Micro-arc oxidation was performed on the cleaned aluminum alloy surface using a DC pulse micro-arc oxidation device with a current density of 10 A / dm 2 , the temperature was controlled at 20-30°C, and the constant-current micro-arc oxidation time was 15 min under constant stirring.
Embodiment 3
[0023] (1) Configure the electrolyte, the concentration of the electrolyte is: sodium hexametaphosphate 25 g / L, potassium hydroxide 4 g / L, sodium tetraborate 6 g / L, EDTA 2 g / L, glycerol 12 g / L ;
[0024] (2) Micro-arc oxidation was performed on the cleaned aluminum alloy surface using a DC pulse micro-arc oxidation device with a current density of 10 A / dm 2 , the temperature was controlled at 20-30°C, and the constant-current micro-arc oxidation time was 15 min under constant stirring.
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