Large-area continuous roller-driven exposure device and method

An exposure device and exposure method technology, applied in the field of optics, can solve problems such as the need to improve the stitching accuracy of single-frame graphics, expensive equipment, and limited technical processing area at one time, so as to achieve good scrolling stitching effect, improved uniformity and stability of light, and low cost effect

Inactive Publication Date: 2017-12-12
UNIV OF SCI & TECH OF CHINA
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Problems solved by technology

[0004] The existing DMD-based maskless lithography technology has a limited processing area at one time, and the processing of large-area graphics can only be spliced ​​by multiple exposures. The existing maskless lithography system can realize large-area graphics exposure splicing, but the equipment is expensive and It is the splicing accuracy between single-frame graphics that needs to be improved

Method used

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  • Large-area continuous roller-driven exposure device and method
  • Large-area continuous roller-driven exposure device and method
  • Large-area continuous roller-driven exposure device and method

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Embodiment Construction

[0022] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the specific content of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0023] Such as figure 1 As shown, the embodiment of the present invention provides a large-area continuous rolling exposure device, including:

[0024] Roll feeding system and optical path system; among them,

[0025] Described roller conveying system comprises: platform, roller conveys the roller conveying mechanism of PET flexible substrate 6, glue pool 8 and cleaning pond 2, and roller conveying mechanism, glue liquid pond 8 and cleaning pond 2 are all located on the ...

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Abstract

The invention discloses a large-area continuous roller-driven exposure device and a method. The large-area continuous roller-driven exposure device comprises a roller conveying system and a light path system, wherein the roller conveying system comprises a platform, a roller conveying mechanism, a glue liquid tank and a cleaning tank, the roller conveying mechanism is used for conveying a PET (polyethylene terephthalate) flexible substrate by rollers, and the roller conveying mechanism, the glue liquid tank and the cleaning tank are respectively arranged on the platform; the light path system comprises a computer, DMD (digital mirror device) digital masks, an illumination subsystem, a focusing subsystem and a projection and imaging subsystem. The large-area continuous roller-driven exposure device has the advantages that on the basis of tension limiting of the flexible substrate, the displacement of the substrate and the inputting of DMD mask patterns for synchronous conversion can be precisely controlled at low software and hardware cost; the continuous glue applying, photoetching and cleaning can be realized, so as to complete the large-area pattern non-mask photoetching.

Description

technical field [0001] The invention relates to the field of optical technology, in particular to a large-area continuous rolling exposure device and method based on a digital micromirror device (DMD) maskless photolithography technology. Background technique [0002] Photolithography technology is a research hotspot in recent years, and it is one of the core technologies in the field of semiconductor processing. With the reduction of mask size, how to reduce the cost of optical mask production and processing has been perplexing researchers, and maskless lithography technology has begun to enter people's field of vision. [0003] Maskless lithography, such as electron beam direct writing and laser direct writing, has high precision but expensive equipment. Maskless lithography based on digital micromirror devices (DMD) has attracted widespread attention in micro-nano processing and related fields. DMD has the advantages of flexibility, parallelism and high speed. It replace...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/2051G03F7/2022G03F7/70058G03F7/70733
Inventor 李木军朱俊杰周有泉邱金峰
Owner UNIV OF SCI & TECH OF CHINA
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