Charge injection inhibition method and device
A charge injection, cuprous oxide technology, applied in the field of power transmission and distribution equipment, can solve the problems of material dielectric performance decline and damage, and achieve the effect of improving insulation life and prolonging insulation life.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0022] An embodiment of the present invention provides a method for suppressing charge injection, and the method includes the following steps:
[0023] A cuprous oxide film is provided on the surface of the insulating material layer or the surface of the metal conductor by evaporation coating;
[0024] The insulating material layer coated with the cuprous oxide film or the metal conductor coated with the cuprous oxide film is insulated and covered on the surface of the current-carrying module of the high-voltage equipment.
[0025] Before forming the insulating material on the surface of the current-carrying part of the high-voltage equipment, a layer of cuprous oxide film is formed on the surface of the insulating material or metal conductor by magnetron sputtering coating or evaporation coating, and then the current-carrying part of the high-voltage equipment is passed Insulation covering on the surface of the module can form a layer of dense cuprous oxide film that fits tig...
Embodiment 2
[0027] see figure 1 , an embodiment of the present invention provides a method for suppressing charge injection, the method comprising the following steps:
[0028] A cuprous oxide film is provided on the surface of the insulating material layer or the surface of the metal conductor by evaporation coating;
[0029] The insulating material layer coated with the cuprous oxide film or the metal conductor coated with the cuprous oxide film is insulated and covered on the surface of the current-carrying module of the high-voltage equipment.
[0030] Optionally, the evaporating coating includes using a mechanical pump and a molecular pump group to evacuate the coating chamber, so that the pressure of the coating chamber is lower than 0.3Pa, and selecting a high-frequency induction heating source as the heat source for the cuprous oxide target, and setting the power as 1kW, the evaporation time is 1h~3h.
[0031] Optionally, the thickness of the cuprous oxide film includes 100nm-30...
Embodiment 3
[0038] see figure 1 , an embodiment of the present invention provides a device for suppressing charge injection, including the high-voltage equipment current-carrying module covered by insulation.
[0039] Optionally, the device includes a medium-high voltage AC / DC bushing or a medium-high voltage AC / DC cable.
[0040] Before the current-carrying part of the high-voltage equipment is wrapped and molded with insulating materials, poured, or three-layer co-extruded, a layer of thickness of 100nm~ For the 300nm cuprous oxide thin film, for samples that require large-area coating, a rotating substrate or multiple evaporation sources can be used to ensure the uniformity of the film layer; A tightly bonded cuprous oxide film is formed between the metal conductor and the insulation. The film can inhibit the injection of charge from the conductor during operation, and at the same time maintain the good insulation and mechanical properties of the electrical insulating material. It ca...
PUM
| Property | Measurement | Unit |
|---|---|---|
| thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 
