A highly hydrophobic organic mesoporous silicon adsorbent and its preparation and application of purifying vocs
A high-hydrophobic, mesoporous silicon technology, applied in inorganic chemistry, other chemical processes, adsorption water/sewage treatment, etc., can solve problems such as limitation of organic group grafting amount, limitation of hydrophobicity, etc., and achieve high adsorption capacity
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0034] Add 4g of block copolymer P123 and 3.7g of hydrochloric acid (37wt%) into 144mL of deionized water, stir for 3h, then add 4g of n-butanol, and stir for 1h at a temperature of 35°C; slowly add 8.5g of ethyl orthosilicate Among them, stir at a temperature of 35°C for 20h, put it into a stainless steel reactor lined with polytetrafluoroethylene, carry out a hydrothermal reaction at 100°C for 24h, only filter without cleaning, and obtain a white precipitate; The precipitate was placed in an oven at 160°C for 5 hours to obtain a white powder, which was washed twice at 40°C with 150mL of ethanol solution of hydrochloric acid (containing 5mL hydrochloric acid (37wt%)), then washed with deionized water, filtered, and dried. The KIT-6 mesoporous silicon material obtained by the template washing method is denoted as KIT-6-W; add 6 mmol of phenyltriethoxysilane to a mixed solution of 50 mL of toluene and 0.2 mL of water, and then add 1 g of KIT-6 -W, heat and stir at 90°C for 24h;...
Embodiment 2
[0037] Add 4g of block copolymer P123 and 3.7g of hydrochloric acid (37wt%) into 144mL of deionized water, stir for 3h, then add 4g of n-butanol, and stir for 1h at a temperature of 35°C; slowly add 8.5g of ethyl orthosilicate Among them, stir at a temperature of 35°C for 20h, put it into a stainless steel reactor lined with polytetrafluoroethylene, carry out a hydrothermal reaction at 100°C for 24h, only filter without cleaning, and obtain a white precipitate; The precipitate was placed in an oven at 160°C for 5 hours to obtain a white powder, which was washed twice at 40°C with 150mL of ethanol solution of hydrochloric acid (containing 5mL hydrochloric acid (37wt%)), then washed with deionized water, filtered, and dried. The KIT-6 mesoporous silicon material obtained by the template washing method is denoted as KIT-6-W.
[0038] The specific surface area of the adsorbent is 886m 2 / g, the pore volume is 1.109cm 3 / g, the pore diameter is 8.15nm. The static adsorption is...
Embodiment 3
[0040] The difference from Example 1 is that there is no addition of 0.2 mL of water and no muffle furnace roasting process in the solvothermal process. The obtained sample was designated as P-KIT-6-W.
[0041] The specific surface area of the adsorbent is 744m 2 / g, the pore volume is 1.054cm 3 / g, the pore diameter is 8.15nm. The static adsorption isotherm of water is as follows: figure 2 As shown, it is higher than KIT-6 in both the low pressure area and the high pressure area.
PUM
| Property | Measurement | Unit |
|---|---|---|
| specific surface area | aaaaa | aaaaa |
| pore size | aaaaa | aaaaa |
| specific surface area | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 


