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Method of forming double-color double-texture PVD film layer on metal substrate and metal substrate obtained thereby

A metal substrate and film layer technology, applied in metal material coating process, coating, vacuum evaporation plating, etc., can solve the problems of complex color diversification, time-consuming, protracted process time, etc., to save manpower and material resources Cost and time cost, reduction of PVD coating process, effect of reducing coating process

Active Publication Date: 2018-07-03
BYD CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The production process of the existing two-color and double-textured PVD film on the surface of the metal substrate is: metal substrate—cleaning—A color PVD coating—spraying UV ink—exposure—developing—removing uncured ink—sandblasting—cleaning—B color PVD coating -Removing paint—cleaning—coating anti-fingerprint film, this process requires two different PVD coatings, because the PVD coating process is time-consuming, especially when the PVD coating is performed twice, the process time will be further increased, thus resulting in longer process time and cost Increased manpower and material resources, low product yield
At the same time, the complexity of the process also limits the variety of colors
If two layers of PVD coatings with different colors are carried out in the same furnace at one time, the problem of film explosion will often occur. Technology has important practical significance and market application prospects

Method used

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  • Method of forming double-color double-texture PVD film layer on metal substrate and metal substrate obtained thereby
  • Method of forming double-color double-texture PVD film layer on metal substrate and metal substrate obtained thereby

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0051] (1) cleaning the stainless steel substrate to remove floating dust and oil stains on the surface of the stainless steel substrate;

[0052] (2) Heat the surface of the cleaned stainless steel substrate to 90°C, ion-clean for 15 minutes at a power of 9kW, and then plate Cr primer, CrC bottom layer, and Ti intermediate film on the stainless steel substrate in sequence by magnetron sputtering layer and TiN top film layer to form a black CrC bottom film layer and a golden TiN top film layer on the surface of the stainless steel substrate. ℃, the vacuum degree is 3×10 -3 Pa, the coating power is 9kW, and the coating time is 8min; the conditions for coating the CrC bottom layer include: the coating temperature is 90°C, and the vacuum degree is 3×10 -3 Pa, coating power is 9kW, coating time is 30min, initial gas C 2 h 2 Gas volume is 10SCCM (standard milliliters per minute), stop gas C 2 h 2 Gas volume is 20SCCM, gas C 2 h 2 The gas volume gradually changes; the conditi...

Embodiment 2

[0059] (1) cleaning the stainless steel substrate to remove floating dust and oil stains on the surface of the stainless steel substrate;

[0060] (2) Heat the surface of the cleaned stainless steel substrate to 80°C, ion-clean for 20 minutes at a power of 8kW, and then sequentially plate Ti primer, TiN bottom layer, and Cr interlayer on the stainless steel substrate by magnetron sputtering TiN layer and CrC top film layer to form a golden TiN bottom film layer and a black CrC top film layer on the surface of the stainless steel substrate. ℃, vacuum degree is 5×10 -3 Pa, the coating power is 8kW, and the coating time is 10min; the conditions for coating the bottom layer of TiN include: the coating temperature is 80°C, and the vacuum degree is 5×10 -3 Pa, the coating power is 10kW, the coating time is 20min, the starting gas is N 2 Gas volume is 10SCCM (standard milliliters per minute), stop gas N 2 Gas volume is 20SCCM, gas N 2 The gas volume gradually changes; the conditi...

Embodiment 3

[0067] (1) cleaning the stainless steel substrate to remove floating dust and oil stains on the surface of the stainless steel substrate;

[0068] (2) Heat the surface of the cleaned stainless steel substrate to 100°C, ion-clean for 10 minutes at a power of 10kW, and then sequentially plate Cr as the bottom layer, silver CrN bottom layer, and Ti on the stainless steel substrate by magnetron sputtering. The middle film layer and the golden TiN top film layer are used to form a silver CrN bottom film layer and a golden TiN top film layer on the surface of the stainless steel substrate. The coating temperature is 100°C, and the vacuum degree is 1×10 -3 Pa, the coating power is 10kW, and the coating time is 5min; the conditions for coating the CrN bottom film layer include: the coating temperature is 100°C, and the vacuum degree is 1×10 -3 Pa, coating power is 6W, coating time is 40min, initial gas N 2 Gas volume is 10SCCM (standard milliliters per minute), stop gas N 2 Gas vol...

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Abstract

The invention relates to the technical field of pattern processing and discloses a method of forming a double-color double-texture PVD film layer on a metal substrate and the metal substrate obtainedthereby. The method comprises the following steps: (1) carrying out primary PVD coating treatment on the metal substrate to form a bottom film layer and a top film layer different in color on the metal substrate; (2) designing a needed pattern on the top film layer, and coating shielding printing ink to the pattern region to be cured; (3) carrying out sand blasting treatment on the substrate obtained in the step (2); (4) removing the top film layer exposed in a non-pattern region; and (5) removing the shielding printing ink cured in the pattern region. The method can plate the double-color double-texture PVD film layer on the metal substrate at one time within a same furnace body without a film exploding phenomena, so that the PVD coating step is reduced, the time is shortened greatly, thecost is lowered, and the product yield is increased obviously.

Description

technical field [0001] The invention relates to the technical field of pattern processing, in particular to a method for forming a two-color and two-texture PVD film layer on a metal substrate and the metal substrate obtained therefrom. Background technique [0002] With the development of science and technology, people have higher and higher requirements for the two-color and two-texture PVD (Physical Vapor Deposition) film layer made on the surface of the metal substrate. The production process of the existing two-color and double-textured PVD film on the surface of the metal substrate is: metal substrate—cleaning—A color PVD coating—spraying UV ink—exposure—developing—removing uncured ink—sandblasting—cleaning—B color PVD coating -Removing paint—cleaning—coating anti-fingerprint film, this process requires two different PVD coatings, because the PVD coating process is time-consuming, especially when the PVD coating is performed twice, the process time will be further incr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/06C23C14/16C23C14/58
CPCC23C14/0635C23C14/0641C23C14/165C23C14/5873
Inventor 赵长涛王继厚
Owner BYD CO LTD
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