Preparation method of copper-doped multilayer graphene
A multi-layer graphene, copper-doped technology, applied in the field of graphene, can solve the problems of unfavorable large-scale production and high price of doped graphene, and achieve the effect of showing smooth and uniform, low cost and excellent optoelectronic properties
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0022] Embodiment 1: A preparation method of copper-doped multilayer graphene, using graphite target material and copper target material as raw materials, adopting DC and RF co-sputtering in magnetron sputtering, introducing copper element into carbon matrix, making The structure and energy level of multilayer graphene are effectively improved, and the specific steps are as follows:
[0023] 1) Copper targets are placed on the RF, and graphite targets are placed on the DC;
[0024] 2) Pump the vacuum pressure of the cavity to 10 -3 Below Pa, argon gas is introduced, and the pressure of argon is 10~0.1Pa;
[0025] 3) Adjust the radio frequency power to 20W~30W, the DC power to 100W~150W, and sputter together for 30min to obtain thin-film copper-doped multilayer graphene.
[0026]
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com