High-levelness electrode preparation process
A preparation process and flatness technology, applied in the field of electrode preparation, can solve the problems of increased operating energy consumption, decreased electrolysis efficiency, uneven electrode spacing, etc., and achieves the effect of refining crystal structure, ensuring uniformity, and ensuring flatness.
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Embodiment 1
[0045] An electrode preparation process with high flatness, comprising:
[0046] Cutting steps: select a titanium plate with a thickness of 1.0mm as the titanium substrate, and use laser cutting technology to cut and process the titanium substrate according to the drawing;
[0047] Sandblasting and polishing steps: sandblasting the titanium substrate in a sandblasting machine, the sandblasting pressure is 0.6MPa, the sand particle size is 30 mesh, the sandblasting time is 2min, and the roughness of the titanium substrate is controlled to 4μm;
[0048] High-temperature annealing step: perform high-temperature annealing and flattening treatment on the titanium substrate after sandblasting in a custom-made fixture. The high-temperature annealing temperature is 600°C, the holding time is 1.5h, and it is naturally cooled to room temperature to ensure that the flatness of the titanium substrate is 0.15mm;
[0049] Alkaline cleaning and degreasing step: put the titanium substrate in ...
Embodiment 2
[0053] An electrode preparation process with high flatness, comprising:
[0054] Cutting step: select a titanium plate with a thickness of 1.5mm as the titanium substrate, and use laser cutting technology to cut and process the titanium substrate according to the drawing;
[0055] Sandblasting and polishing steps: sandblasting the titanium substrate in a sandblasting machine, the sandblasting pressure is 0.8MPa, the sand particle size is 50 mesh, the sandblasting time is 3min, and the roughness of the titanium substrate is controlled to 5μm;
[0056] High-temperature annealing step: perform high-temperature annealing and flattening treatment on the titanium substrate after sandblasting in a custom-made fixture. The high-temperature annealing temperature is 900°C, the holding time is 2 hours, and it is naturally cooled to room temperature to ensure that the flatness of the titanium substrate is 0.12mm;
[0057] Alkaline washing and degreasing steps: put the titanium substrate i...
Embodiment 3
[0061] An electrode preparation process with high flatness, comprising:
[0062] Cutting step: select a titanium plate with a thickness of 2.0mm as the titanium substrate, and use laser cutting technology to cut and process the titanium substrate according to the drawing;
[0063] Sandblasting and polishing steps: sandblasting the titanium substrate in a sandblasting machine, the sandblasting pressure is 1MPa, the sand particle size is 80 mesh, the sandblasting time is 5min, and the roughness of the titanium substrate is controlled to be 8μm;
[0064] High-temperature annealing step: perform high-temperature annealing and flattening treatment on the titanium substrate after sandblasting in a custom-made fixture. The high-temperature annealing temperature is 1100°C, the holding time is 3 hours, and it is naturally cooled to room temperature to ensure that the flatness of the titanium substrate is 0.08mm;
[0065] Alkaline washing and degreasing steps: put the titanium substrate...
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Abstract
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