Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A kind of dust removal method and production system for organic silicon and polysilicon production

A production system, organic silicon technology, applied in separation methods, chemical instruments and methods, and separation of dispersed particles, etc., can solve the problems of small particles that cannot be removed, and the service life of dust collectors is short, so as to ensure dust removal performance, reduce energy consumption, The effect of reducing emissions

Active Publication Date: 2021-05-11
JIANGSU JINNIU ENVIRONMENTAL ENG EQUIP +1
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Aiming at the deficiencies of the prior art, the present invention provides a method that can effectively remove solid particles in organic silicon and polysilicon high-temperature synthesis gas, reduce the loss of high boiling substances, and solve the problem that small particles cannot be removed in the conventional dry dust removal process and the service life of the dust collector Dust removal method and production system for organosilicon and polysilicon production

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of dust removal method and production system for organic silicon and polysilicon production
  • A kind of dust removal method and production system for organic silicon and polysilicon production

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] Embodiment 1: A kind of production system that is used for organic silicon, polysilicon production dedusting method, comprises high temperature too cotton dust collector 1, heat exchanger 2, washing tower 3, waste gas inlet pipe 4 connects high temperature too cotton dust collector 1 flue gas Inlet 1.1, high temperature too cotton dust collector 1 outlet 1.2 is connected to scrubber 3 flue gas inlet 3.1 through outlet pipe 5, and outlet pipe 5 is provided with No. 1 heat exchange inlet pipe 6 connected to heat exchanger 2 No. 1 inlet 2.1, for The No. 1 air outlet 2.2 of the heat exchanger is connected to the air outlet pipe 5 through the No. 1 heat exchange outlet pipe 8, and the No. 2 air outlet 2.3 of the heat exchanger is connected to the back-blowing system of the high-temperature Taimian dust collector 1 through the back-blowing pipe 9, and the No. 2 heat exchanger The gas inlet 2.4 is connected with the methyl chloride gas pipeline 10 . The high temperature Taimia...

Embodiment 2

[0020] Embodiment 2: with reference to embodiment 1, cyclone dust collector 12 can be set before high-temperature too cotton deduster 1, at first with gaseous phase material and solid phase silicon powder and catalyzer discharge from organosilicon or polysilicon fluidized bed reactor synthesis gas First pass through the cyclone dust collector 12 for pretreatment, and then enter the high temperature too cotton dust collector 1 for dry dust removal.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A dust removal method and production system for organosilicon and polysilicon production, comprising the following steps: first, the synthesis gas discharged from the organosilicon or polysilicon fluidized bed reactor with gas phase materials, solid phase silicon powder and catalyst is passed through a dry The dedusting device performs dry dedusting, and then discharges the syngas after dry dedusting into the washing device for wet dedusting. The diameter of ≤ 1um. It can effectively remove solid particles in organic silicon and polycrystalline silicon high-temperature synthesis gas, reduce the loss of high boiling substances, and solve the problems that small particles cannot be removed in the conventional dry dust removal process and the service life of the dust collector is short.

Description

technical field [0001] The invention relates to a dust removal system and a treatment method, in particular to a dust removal method for organic silicon and polysilicon production and a production system thereof. Background technique [0002] In the production process of organosilicon and polysilicon, the synthesis gas from the fluidized bed reactor contains some solid silicon powder and the catalyst needs to be separated. At present, it is generally used in the industry to remove most of the equivalent diameter of the gas-solid phase material through a cyclone dust collector. Particles >10μm, then directly enter the washing tower, the top of the tower adopts monomer for wet dust removal, and the unremoved particles in the gas-solid phase materials are removed by the washing tower, and are mixed with high boiling substances in the monomer from the bottom of the washing tower. The slurry is discharged, and the high boiler is a mixture that can be cracked into the target pr...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B01D50/00
CPCB01D50/10B01D50/60
Inventor 孙明华尚文君王兆民王宇光李全谷新春
Owner JIANGSU JINNIU ENVIRONMENTAL ENG EQUIP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com