Oxime ester compound and a photocurable composition comprising the same

A photocurable, compound technology, applied in photosensitive materials, optics, organic chemistry, etc. for optomechanical equipment, which can solve problems such as reduction of foreign matter defect rate

Active Publication Date: 2018-09-07
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0017] In addition, the object of the present invention is to provide a photocurable composition, which is a photocurable composition containing a photocurable compound and a photopolymerization initiator, by including the novel oxime ester compound of the present invention as the photopolymerization initiator agent, so that it can suppress the occurrence of outgassing while having high sensitivity to reduce the foreign matter defect rate, and can suppress the dissolution of the solvent to improve the problem of liquid crystal contamination caused by the dissolution of the solvent that contaminates the liquid crystal

Method used

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  • Oxime ester compound and a photocurable composition comprising the same
  • Oxime ester compound and a photocurable composition comprising the same
  • Oxime ester compound and a photocurable composition comprising the same

Examples

Experimental program
Comparison scheme
Effect test

manufacture example 1

[0089] Production example 1. Production of oxime ester compound of chemical formula 2

[0090] [chemical formula 2]

[0091]

[0092] 1-1. Haloalkylation reaction of carbazole

[0093] [Reaction 1]

[0094]

[0095] After dissolving carbazole 25g (molecular weight 167.206; 0.15mol) in tetrahydrofuran 50mL and adding 1-bromo-3-chloropropane 70.6g (molecular weight 157.44; 0.45mol) and tetrabutylammonium bromide 0.36g solution, add 50% caustic soda 48g, then heated and stirred at 45-50°C for 5-6 hours.

[0096] After the reaction liquid was cooled to normal temperature and the upper layer was separated, the tetrahydrofuran was removed by reducing pressure, and then the excess 1-bromo-3-chloropropane was removed to obtain 20 g of the compound of the following chemical formula 3 in the oil phase (molecular weight: 243.73100; 0.083mol).

[0097] [chemical formula 3]

[0098]

[0099] 1-2. Acylation reaction of the compound of chemical formula 3

[0100] Dissolv...

manufacture example 2

[0118] Production example 2. Production of oxime ester compound of chemical formula 6

[0119] [chemical formula 6]

[0120]

manufacture example 2-1

[0121] Production Example 2-1. Haloalkylation reaction of carbazole

[0122] In addition to using 1-bromo-3-fluoropropane (1-Bromo-3-fluoropropane) instead of 1-bromo-3-chloropropane to carry out the reaction, in the haloalkylation reaction with Production Example 1-1. Carbazole The reaction is carried out under the same conditions to obtain the compound of chemical formula 7.

[0123] [Reaction 5]

[0124]

[0125] [chemical formula 7]

[0126]

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Abstract

The present invention provides an oxime ester-based compound and a photocurable composition containing the oxime ester-based compound, and more particularly, it relates to a photocurable compound comprising a photocurable compound and a photopolymerization initiator, and the photopolymerization initiator contains an oxime ester-based compound. In the photocurable composition, the photocurable composition can suppress the occurrence of outgassing while suppressing the occurrence of degassing, thereby suppressing the elution of the solvent and improving the problem of liquid crystal contamination caused by solvent elution of the contaminated liquid crystal. The oxime ester compound is represented by the following Chemical Formula 1, wherein R1 is a C1 to C12 linear or branched alkyl group; and the R2 is a C1 to C12 linear or branched alkyl group; X is any one selected from the group consisting of Cl, Br and I; the Y is hydrogen, a C1-C12 linear or branched alkyl group, a halogen atom, anamino group or a C1-C4 alkoxy group.

Description

technical field [0001] The present invention relates to an oxime ester compound and a photocurable composition containing the same. More specifically, it relates to an oxime ester-based compound capable of suppressing outgassing to reduce the foreign matter defect rate while having high sensitivity and being excellent in solvent elution suppression and capable of preventing liquid crystal contamination, and a photocurable combination containing the same. things. Background technique [0002] Photoactive compounds are substances that decompose by absorbing light to generate chemically active atoms or molecules, which are used as photosensitive agents for various compositions such as photocurable inks, photosensitive printing plates, photoresists, etc. Polymerization initiators are widely used. [0003] General examples of known photopolymerization initiators include acetophenone-based compounds, benzophenone-based compounds, triazine-based compounds, biimidazole-based compo...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C07D209/86C08F2/50G03F7/004G03F7/027
CPCG03F7/004G03F7/027C07D209/86C08F2/50C07D209/82G03F7/031
Inventor 金奉奎崔汉永张虎振
Owner DONGWOO FINE CHEM CO LTD
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