Preservative-free skincare mask essence

A preservative-free and essence-free technology, which is applied in the medical and beauty fields, can solve the problems of mask state change, denaturation, and essence ineffectiveness, etc., and achieve the effect of reducing irritation and suitable for sensitive skin

Inactive Publication Date: 2018-09-18
杭州语奥生物科技有限公司
View PDF4 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, the use of high-temperature sterilization will bring new technical problems: the most important thing in the mask is the various active substances in the essence. Most of the essence of

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preservative-free skincare mask essence
  • Preservative-free skincare mask essence
  • Preservative-free skincare mask essence

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1 to Embodiment 7

[0049]

[0050]

[0051] As can be seen from the above table, the difference between Example 1-Example 4 is the ratio of the chelating agent EDTA-2Na in the system, and the difference between Example 1 and Example 5-7 is that the thickener carbomer is in the system proportion. Wherein the effect of arginine in this system is to regulate pH, because in this system, the composition that has the greatest influence on pH is carbomer, so the addition amount of arginine is mainly determined by the amount of carbomer, therefore, embodiment 1 and the amount of arginine in Examples 5-7 are also adjusted accordingly.

[0052] Accurately weigh each raw material according to the proportion of the formula in the above table, first swell the carbomer, sodium hyaluronate, and zinc hyaluronate in advance, and swell by 1%. Add an appropriate amount of water to the liquid mixing tank at room temperature, and add EDTA-2Na, D-panthenol, allantoin, glyceryl polyether-26, propylene glycol, g...

Embodiment 8- Embodiment 14

[0062]

[0063]

[0064] It can be seen from the above table that the difference between Example 8-Example 11 lies in the ratio of glyceryl polyether-26 to hyaluronic acid, and the difference between Example 8 and Examples 12-14 lies in the presence of zinc hyaluronate in the system The ratio of glyceryl ether-26 and zinc hyaluronate has a correlation, therefore, the percentage of glyceryl ether-26 in Example 8 and Examples 12-14 is also modified accordingly.

[0065] Accurately weigh each raw material according to the proportion of the formula in the above table, first swell the carbomer, sodium hyaluronate, and zinc hyaluronate in advance, and swell by 1%. Add appropriate amount of water to the liquid mixing tank at room temperature, and add EDTA-2, Na D-panthenol, allantoin, glyceryl polyether-26, propylene glycol, glycerin, trehalose, betaine, Dipotassium glycyrrhizinate, after dissolving completely, add swollen sodium hyaluronate, zinc hyaluronate, and carbomer, sti...

Embodiment 15

[0075] In order to obtain a preservative-free skin care paste essence that meets the purpose of the invention of this embodiment, the following raw materials and raw material ratios are used in this embodiment: 0.05% of EDTA-2Na, 0.50% of D-panthenol, 0.15% of allantoin, Glyceryl polyethers-260.50%, sodium hyaluronate 0.15%, propylene glycol 4%, glycerin 3%, trehalose 1%, betaine 3%, dipotassium glycyrrhizinate 0.10%, arginine 0.15%, zinc hyaluronate 0.05 %, carbomer 0.10%, pearl powder 0.50%, and the rest is water.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a preservative-free skincare mask essence. The formula of the mask essence contains no preservatives or other sensitizing substances, so the mask essence reduces the irritation of a mask to skins, and is suitable for sensitive skins. All ingredients in the formula do not degenerate or change the physical state after existing at 115 DEG C for 15-30 min; the addition of zinchyaluronate makes the mask essence have anti-inflammatory and moisturizing effects; and the molecular weights of the sodium hyaluronate have three types which are a large type, a medium type and a small type, and a ratio among the three types of molecular weights is controlled to achieve a best moisturizing effect.

Description

technical field [0001] The invention relates to the fields of medical treatment and beauty, in particular to a preservative-free skin care patch essence. Background technique [0002] Skin care stickers include facial masks, eye masks, and cold compresses, etc., and usually include membrane materials and essences. The folded membrane materials are soaked in the essence, because the ingredients of the essence with hydrating, repairing, anti-aging, and correcting functions are relatively high. In order to solve this problem, almost all the skin care patches that come out now contain preservative ingredients to solve the microbial problem; even skin care patches that claim to be free of preservatives are false propositions, just Added new ingredients not in the list of preservatives to achieve the purpose of preservation. The addition of preservatives solves the problem of shelf life, but at the same time it also brings other problems such as irritation and allergies, making b...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): A61K8/86A61K8/73A61K8/63A61K8/60A61K8/49A61K8/44A61K8/27A61K8/34A61K8/42A61Q19/00A61P29/00
CPCA61K8/735A61K8/27A61K8/345A61K8/42A61K8/44A61K8/4946A61K8/60A61K8/63A61K8/86A61K2800/30A61K2800/72A61Q19/00A61Q19/005
Inventor 刘爱艺
Owner 杭州语奥生物科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap