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Polyvinylidene difluoride membrane, manufacturing method thereof, and purifying brine method thereof

A technology of polyvinylidene fluoride and thin film, which is applied in the direction of chemical instruments and methods, membrane, membrane technology, etc., can solve the problems of reducing the life of DCMD and affecting the stability of DCMD, and achieves low cost, good salt resistance and simple manufacturing process Effect

Inactive Publication Date: 2018-09-25
IND TECH RES INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The hydrophobic nature of the surface will affect the stability of the DCMD operation process, such as low hydrophobicity or roughness will reduce the life of DCMD

Method used

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  • Polyvinylidene difluoride membrane, manufacturing method thereof, and purifying brine method thereof
  • Polyvinylidene difluoride membrane, manufacturing method thereof, and purifying brine method thereof
  • Polyvinylidene difluoride membrane, manufacturing method thereof, and purifying brine method thereof

Examples

Experimental program
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Effect test

preparation example 1

[0037] Take triethyl phosphate (TEP, triethyl phosphate, Alfa Aesar) and polyvinylidene fluoride (PVDF, melt viscosity between 35 to 60 kpoise) to prepare a 6-10wt% PVDF polymer solution, stir with a magnet at 30 Dissolve at -80°C until PVDF is completely dispersed. When the PVDF is completely dissolved, control the internal temperature and keep stirring the solution at the set temperature for more than 48 hours, then let it stand for more than 24 hours or remove the air bubbles in the dope solution with reduced pressure and vacuum.

preparation example 2

[0038] Preparation example 2 (modification of carbon nanotubes)

[0039] Disperse 10 grams of carbon nanotubes in 100 grams of 30-50wt% hydrogen peroxide and stir at 50-105°C for 3-6 hours to oxidize the surface of the carbon nanotubes, filter the reacted carbon nanotubes and After washing with deionized water until neutral, place in an oven and dry at a low temperature of 50-80°C to obtain oxidatively modified carbon nanotubes. Preparation example 3 (modification of carbon nanotubes)

preparation example 3

[0040] Disperse 10 grams of carbon nanotubes in 100 grams of 3-5M nitric acid, stir and react at 50-105°C for 3-6 hours to oxidize the surface of carbon nanotubes, filter the reacted carbon nanotubes and remove After washing with ion water to neutrality, place in an oven and dry at a low temperature of 50-80°C to obtain oxidatively modified carbon nanotubes.

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Abstract

A polyvinylidene difluoride membrane is provided. The polyvinylidene difluoride membrane including polyvinylidene difluoride having a melt viscosity of 35 to 60 (k poise), and the surface of the polyvinylidene difluoride membrane has a pore size of 0.1 [mu]m to 5 [mu]m. A method of manufacturing a porous polyvinylidene difluoride membrane and a method of purifying brine are also provided. The method of purifying brine includes the above-mentioned polyvinylidene difluoride membrane.

Description

technical field [0001] The present disclosure relates to polyvinylidene fluoride films, and more particularly to polyvinylidene fluoride films having holes on the surface. Background technique [0002] Direct contact membrane distillation (direct contact membrane distillation, DCMD) technology is to control the temperature gradient of the fluid on both sides of the membrane, and use the formed vapor pressure difference as the driving force, so that the water fed with salt on the high temperature side is transported through the pores of the membrane as water vapor molecules. to the cold side and condense into a liquid to separate the water from the brine. In DCMD, the film itself does not directly participate in the screening of substances by the size of the pores, but only uses the interface characteristics to separate two solutions at different temperatures. Overall, thin film distillation includes the processes of vaporization, mass transfer and condensation, which is simi...

Claims

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Application Information

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IPC IPC(8): C08J5/18C08L27/16C08K9/02C08K7/24D01D1/02D04H3/007D01D5/24B01D71/34B01D67/00C02F1/44
CPCB01D69/125B01D71/34C02F1/447C08J5/18C08K7/24C08K9/02D01D1/02D01D5/24D04H3/007C08J2327/16C08K2201/011C08L2203/16C08L27/16B01D67/0016B01D67/0079B01D69/141B01D71/021B01D2325/24C08J9/009C08J9/0071B01D61/364B01D69/02C08J2201/0544C08J2205/044B01D2325/04C08J9/28B01D2323/081B01D2325/02833B01D69/14111B01D67/002C08K9/00C08K3/041B01D71/0212
Inventor 李佳玲黄立德童国伦
Owner IND TECH RES INST
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