Polyvinylidene difluoride membrane, manufacturing method thereof, and purifying brine method thereof

A technology of polyvinylidene fluoride and thin film, which is applied in the direction of chemical instruments and methods, membrane, membrane technology, etc., can solve the problems of reducing the life of DCMD and affecting the stability of DCMD, and achieves low cost, good salt resistance and simple manufacturing process Effect

Inactive Publication Date: 2018-09-25
IND TECH RES INST
View PDF4 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The hydrophobic nature of the surface will affect the stability of the DCMD opera

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Polyvinylidene difluoride membrane, manufacturing method thereof, and purifying brine method thereof
  • Polyvinylidene difluoride membrane, manufacturing method thereof, and purifying brine method thereof
  • Polyvinylidene difluoride membrane, manufacturing method thereof, and purifying brine method thereof

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0036] Preparation Example 1

[0037] Take triethyl phosphate (TEP, triethyl phosphate, Alfa Aesar) and polyvinylidene fluoride (PVDF, with a melt viscosity of 35 to 60 kpoise) to prepare a 6-10wt% PVDF polymer solution, stir it with a magnet at 30 Dissolve at -80°C until PVDF is completely dispersed. After the PVDF is completely dissolved, control the internal temperature to keep stirring the solution at the set temperature for more than 48 hours, then let it stand for more than 24 hours or use a reduced pressure vacuum to remove bubbles in the dope solution.

Example Embodiment

[0038] Preparation example 2 (modification of carbon nanotubes)

[0039] Disperse 10 grams of carbon nanotubes in 100 grams of 30-50wt% hydrogen peroxide and stir and react at 50-105°C for 3-6 hours to cause oxidation reaction on the surface of the carbon nanotubes, and filter the reacted carbon nanotubes. After being washed with deionized water to neutrality, it is placed in an oven and dried at a low temperature of 50-80° C. to obtain oxidized modified carbon nanotubes. Preparation example 3 (modification of carbon nanotubes)

Example Embodiment

Example 3

[0040] Disperse 10 grams of carbon nanotubes in 100 grams of 3-5M nitric acid, stir and react at 50-105°C for 3-6 hours to oxidize the surface of the carbon nanotubes, and filter the reacted carbon nanotubes. After the ionized water is cleaned to neutrality, it is placed in an oven and dried at a low temperature of 50-80° C. to obtain oxidized modified carbon nanotubes.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Surface apertureaaaaaaaaaa
Login to view more

Abstract

A polyvinylidene difluoride membrane is provided. The polyvinylidene difluoride membrane including polyvinylidene difluoride having a melt viscosity of 35 to 60 (k poise), and the surface of the polyvinylidene difluoride membrane has a pore size of 0.1 [mu]m to 5 [mu]m. A method of manufacturing a porous polyvinylidene difluoride membrane and a method of purifying brine are also provided. The method of purifying brine includes the above-mentioned polyvinylidene difluoride membrane.

Description

technical field [0001] The present disclosure relates to polyvinylidene fluoride films, and more particularly to polyvinylidene fluoride films having holes on the surface. Background technique [0002] Direct contact membrane distillation (direct contact membrane distillation, DCMD) technology is to control the temperature gradient of the fluid on both sides of the membrane, and use the formed vapor pressure difference as the driving force, so that the water fed with salt on the high temperature side is transported through the pores of the membrane as water vapor molecules. to the cold side and condense into a liquid to separate the water from the brine. In DCMD, the film itself does not directly participate in the screening of substances by the size of the pores, but only uses the interface characteristics to separate two solutions at different temperatures. Overall, thin film distillation includes the processes of vaporization, mass transfer and condensation, which is simi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C08J5/18C08L27/16C08K9/02C08K7/24D01D1/02D04H3/007D01D5/24B01D71/34B01D67/00C02F1/44
CPCB01D69/125B01D71/34C02F1/447C08J5/18C08K7/24C08K9/02D01D1/02D01D5/24D04H3/007C08J2327/16C08K2201/011C08L2203/16C08L27/16B01D67/0016B01D67/0079B01D69/141B01D71/021B01D2325/24C08J9/009C08J9/0071B01D61/364B01D69/02C08J2201/0544C08J2205/044B01D2325/04C08J9/28B01D2323/081B01D2325/02833B01D67/002C08K9/00C08K3/041B01D2323/08
Inventor 李佳玲黄立德童国伦
Owner IND TECH RES INST
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products