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Curing Substrate Pretreatment Compositions in Nanoimprint Lithography

A technology of pretreatment and composition, applied in nanotechnology, nanotechnology, nanotechnology for information processing, etc., can solve problems such as pollution

Active Publication Date: 2022-03-29
CANON KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the presence of uncured pretreatment composition after completion of the imprint lithography process can create defects in the resulting patterned layer if the pretreatment composition is allowed to spread over the imprinted fields Evaporation can lead to pollution

Method used

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  • Curing Substrate Pretreatment Compositions in Nanoimprint Lithography
  • Curing Substrate Pretreatment Compositions in Nanoimprint Lithography
  • Curing Substrate Pretreatment Compositions in Nanoimprint Lithography

Examples

Experimental program
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Effect test

Embodiment

[0171] In the following examples, the reported interface energy at the interface between the imprint resist and air was measured by the maximum bubble pressure method. The measurement was carried out using a BP2 bubble pressure tensiometer manufactured by Krüss GmbH, Hamburg, Germany. In the maximum bubble pressure method, the maximum internal pressure of a bubble formed in a liquid by means of a capillary is measured. Using a capillary of known diameter, the surface tension can be calculated from the Young-Laplace formula. For some pretreatment compositions, the values ​​reported by the manufacturer for the interfacial energy at the interface between the pretreatment composition and air are provided.

[0172] Viscosity Viscosity was measured using a Brookfield DV-II+Pro with a small sample adapter using a temperature controlled bath set at 23°C. The reported viscosity values ​​are the average of five measurements.

[0173] An adhesive layer was prepared on a substrate by com...

Embodiment 1

[0180] In Example 1, droplets of imprint resist were deployed on a substrate with a coating of pretreatment composition A (Sartomer 492 or "SR492"). SR492, available from Sartomer, Inc. (Pennsylvania, USA), is propoxylated (3) trimethylolpropane triacrylate (multifunctional acrylate). Figure 14 An image of a droplet 1400 of imprint resist on a pretreatment coating 1402 and the resulting composite coating 1404 is shown 1.7 seconds after initiation of dispensing in discrete portions in a staggered grid pattern. In this example, the droplet retains its spherical cap-like shape, and the spreading of the imprint resist is restricted. Such as Figure 14 As can be seen in Comparative Example 1, when the droplet 1400 spreads beyond the imprint resist on the adhesive layer in Comparative Example 1, the droplet is kept separated by the pretreatment coating 1402, which forms a boundary 1406 around the droplet. Certain components of the imprint resist spread out beyond the center of th...

Embodiment 2

[0181] In Example 2, droplets of imprint resist were deployed on a substrate with a coating of pretreatment composition B (Sartomer 351HP or "SR351HP"). SR351HP, available from Sartomer, Inc. (Pennsylvania, USA), is trimethylolpropane triacrylate (multifunctional acrylate). Figure 15 An image of a drop 1500 of imprint resist on a pretreatment coating 1502 and the resulting composite coating 1504 is shown 1.7 seconds after initiation of drop dispensing in a square grid pattern. After 1.7 seconds, the droplet 1500 covers most of the surface area of ​​the substrate and is separated by the pretreatment coating 1502, which forms a border 1506 around the droplet. Droplet 1500 is more uniform than droplet 1400 in Example 1, so a significant improvement in spreading over Example 1 is observed. The greater degree of spreading is at least partially attributable to the difference in surface tension between pretreatment composition B and the imprint resist than the difference in surface...

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Abstract

Nanoimprint lithography includes disposing a pretreatment composition on a nanoimprint lithography substrate to form a pretreatment coating; disposing discrete portions of an imprint resist on the pretreatment coating, the imprinting Discrete portions of resist cover target areas of the nanoimprint lithographic substrate. The imprint resist is a polymerizable composition and contains a polymerization initiator. A composite polymeric coating is formed on the nanoimprint lithography substrate as the discrete portions of the imprint resist spread out beyond target areas of the nanoimprint lithography substrate. The composite polymeric coating is contacted with the nanoimprint lithography template. The polymerization initiator is activated, and the composite polymerizable coating is polymerized to produce a composite polymer layer on the nanoimprint lithography substrate, and the uncured portion of the pretreatment coating. After polymerizing the composite polymerizable coating to produce the composite polymer layer, the uncured portion of the pretreatment coating is polymerized.

Description

[0001] Cross References to Related Applications [0002] This application claims U.S. Patent Application Serial No. 62 / 316,377, filed March 31, 2016, entitled "Curing Substrate Pretreatment Compositions in Nanoimprint Lithography," and titled March 24, 2017 to the benefit of US Patent Application Serial No. 15 / 469,298 for "Curing Substrate Pretreatment Compositions in Nanoimprint Lithography"; each of which is hereby incorporated by reference herein in its entirety. technical field [0003] The present invention relates to cured substrate pretreatment compositions in nanoimprint lithography processes and pretreatment compositions suitable for curing independent of imprint resists. Background technique [0004] As the semiconductor processing industry strives for greater throughput while increasing the number of circuits per unit area, attention has focused on the continued development of reliable high-resolution patterning techniques. One such technique in use today is comm...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/00B29C59/02B82Y10/00
CPCG03F7/095G03F7/0002G03F7/161G03F7/2004
Inventor 蒂莫西·布赖恩·斯塔霍维亚克刘卫军
Owner CANON KK