Superstable silver-tantalum composite surface-reinforced Raman scattering substrate and preparation method
A technology of surface-enhanced Raman and composite materials, which is applied in metal material coating technology, sputtering plating, ion implantation plating, etc., can solve the problems of complex adsorption, separation, catalysis, sensing, and preparation process, which is inconvenient and inconvenient. Preparation and other issues, to achieve the effect of good chemical stability, simple operation, good surface plasmon performance
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[0039] The invention provides a method for preparing a silver-tantalum composite SERS substrate material, comprising the following steps:
[0040] 1) Single crystal silicon wafer is selected as the substrate, and the single crystal silicon wafer substrate is selected from Si(100), Si(111), SiO 2 sheet or quartz glass. And carry out pretreatment before coating; specifically, use deionized water, absolute ethanol, and acetone to ultrasonically clean the surface of the single crystal silicon wafer for 10-20 minutes.
[0041] 2) Put the cleaned single crystal silicon substrate into the magnetron sputtering coating equipment to prepare the chromium primer layer, specifically using Ar gas or nitrogen as the sputtering atmosphere, under the condition of applying a voltage of 60V to the substrate, using Magnetron sputtering is performed on the chromium target by radio frequency, and the radio frequency frequency is controlled at 250kHz; a layer of chromium film with a thickness of 10...
Embodiment 1
[0047] 1) Cleaning: immerse the Si(100) substrate in ethanol and acetone solution for 10 minutes, take it out and soak it in deionized water for 10 minutes, then take it out, dry it with high-purity nitrogen, and then quickly put it into the magnetron sputtering coating equipment .
[0048] 2) Chromium primer preparation: prepare a chromium primer on the surface of the cleaned Si(100) substrate, use Ar gas as the sputtering atmosphere, apply a voltage of 60V, and use radio frequency to perform magnetron sputtering on the chromium target with a radio frequency of 250kHz; The thickness of the chromium film is 100nm.
[0049] 3) Silver and tantalum deposition: After the preparation of the chromium base layer, co-sputtering of silver and tantalum elements is carried out, in which the applied voltage is 60V, the current of the silver target is 5A, the current of the tantalum target is 2A, and the deposition time is 30min. The thickness of silver and tantalum composite film deposit...
Embodiment 2
[0061] 1) Cleaning: immerse the Si(111) substrate in ethanol and acetone solution for 10 minutes, take it out and soak it in deionized water for 15 minutes, then take it out, dry it with high-purity nitrogen, and then quickly put it into the magnetron sputtering coating equipment .
[0062] 2) Chromium primer preparation: prepare chromium primer on the clean single crystal silicon surface, use nitrogen as the sputtering atmosphere, apply 60V voltage, and use radio frequency to perform magnetron sputtering on the chromium target with a radio frequency frequency of 250kHz; the thickness of the chromium film 500nm.
[0063] 3) Silver and tantalum deposition: After the preparation of the chromium base layer, co-sputtering of silver and tantalum elements is carried out, in which the applied voltage is 60V, the current of the silver target is 5A, the current of the tantalum target is 5A, and the deposition time is 15min. The thickness of silver and tantalum composite film deposited...
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