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A hollow closed-cell sio 2 Anti-reflection film and its preparation method

An anti-reflection film and hollow technology, applied in the direction of coating, etc., can solve the problems of lack of cost-effectiveness and high-flux capacity, and achieve the effect of increasing the utilization rate of light and solving the effect of low light transmittance

Inactive Publication Date: 2019-12-03
NORTHWESTERN POLYTECHNICAL UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Current methods for fabricating anti-reflective coatings include photolithography, bevel-angle deposition, particle sputtering, catalytic etching, and chemical vapor deposition, but these methods lack cost due to the requirements of vacuum processing, multiple etching steps, and limited controllability of the refractive index. Benefits and High Throughput Capabilities

Method used

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  • A hollow closed-cell sio <sub>2</sub> Anti-reflection film and its preparation method
  • A hollow closed-cell sio <sub>2</sub> Anti-reflection film and its preparation method
  • A hollow closed-cell sio <sub>2</sub> Anti-reflection film and its preparation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] (1) Dissolve polyacrylic acid in ammonium hydroxide to obtain solution I; slowly add solution I to ethanol to obtain solution II; add tetraethyl orthosilicate to solution II and continue to react for 8 hours to obtain alkali Sexual hollow SiO 2 Sol; the basic hollow SiO 2 The sol was left at room temperature to remove ammonia for 12 hours, and finally hollow SiO was obtained. 2 Sol;

[0032] The molar ratio of polyacrylic acid: ammonium hydroxide: orthosilicate: ethanol is 1:74.8:3.8:14.4, and the hollow SiO 2 SiO in sol 2 The mass fraction is 2.07%;

[0033] (2) Add tetraethyl orthosilicate to ethanol and mix uniformly to obtain solution III; mix hydrochloric acid catalyst and deionized water uniformly and slowly add to solution III to react for 4 hours, pH is 1, and acidic silica sol is obtained ;

[0034] Ethyl orthosilicate: hydrochloric acid: deionized water: the molar ratio of ethanol is 1:0.085:6.4:3.8; SiO in the described acidic silica sol 2 The mass fra...

Embodiment 2

[0038] (1) Dissolve polyacrylic acid in ammonium hydroxide to obtain solution I; slowly add solution I to ethanol to obtain solution II; add tetraethyl orthosilicate to solution II and continue the reaction for 10 hours to obtain alkali Sexual hollow SiO 2 Sol; the basic hollow SiO 2 The sol was left at room temperature to remove ammonia for 12 hours, and finally hollow SiO was obtained. 2 Sol;

[0039] The molar ratio of polyacrylic acid: ammonium hydroxide: orthosilicate: ethanol is 1:74.8:3.8:14.4, and the hollow SiO 2 SiO in sol 2 The quality score is 6.56%;

[0040] (2) Add tetraethyl orthosilicate to ethanol and mix uniformly to obtain solution III; mix hydrochloric acid catalyst and deionized water uniformly and slowly add to solution III to react for 6 hours, and the pH is 1.5 to obtain acidic silica sol ;

[0041] Ethyl orthosilicate: hydrochloric acid: deionized water: the molar ratio of ethanol is 1:0.085:6.4:3.8; SiO in the described acidic silica sol 2 The ...

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Abstract

The invention discloses a hollow closed-hole SiO2 antireflection film and a preparation method thereof, and belongs to the technical field of preparation of optical elements. The preparation method comprises the steps of (1) preparation of hollow SiO2 sol; (2) preparation of acidic silica sol; (3) preparation of coating solution; and (4) spin coating and calcination. According to the hollow closed-SiO2 antireflection film and the preparation method thereof, the anti-reflection film has a high light transmittance, accurate control of the thickness of the antireflection film is realized, and theuniformity of the light transmittance of the antireflection film is improved.

Description

technical field [0001] The invention belongs to the technical field of preparation of optical elements, in particular to a hollow closed-cell SiO 2 Anti-reflection film and preparation method thereof. Background technique [0002] Anti-reflection coating, also known as anti-reflection coating, the main function is to reduce or eliminate the reflected light of optical surfaces such as lenses, prisms, and plane mirrors, thereby increasing the light transmission of these components, reducing or eliminating stray light in the system, and is widely used in daily life , industry, astronomy, military science, electronics and other fields, used to improve the utilization of light. [0003] Current methods for fabricating anti-reflective coatings are photolithography, bevel-angle deposition, particle sputtering, catalytic etching, and chemical vapor deposition, but these methods lack cost due to the requirements of vacuum processing, multiple etching steps, and limited controllabili...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B1/11
CPCG02B1/11
Inventor 焦剑黄粉超邵雨滴王佳
Owner NORTHWESTERN POLYTECHNICAL UNIV