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Electric Field Responsive Elastomer Microstructure Surface Liquid Transport Device and Preparation Method

A technology of electric field response and structured surface, applied in applications, flat products, and other household appliances, can solve the problems of poor controllability and flexibility, and achieve the effect of simple operation, fast response, and fast in-situ

Active Publication Date: 2021-01-26
BEIHANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the current control methods for mechanical stretching of flexible substrates have poor flexibility and controllability, and are difficult to combine with practical applications.

Method used

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  • Electric Field Responsive Elastomer Microstructure Surface Liquid Transport Device and Preparation Method
  • Electric Field Responsive Elastomer Microstructure Surface Liquid Transport Device and Preparation Method
  • Electric Field Responsive Elastomer Microstructure Surface Liquid Transport Device and Preparation Method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] A PDMS film with anisotropic wetting properties includes a substrate and the micro-nano material, the substrate is an elastomer with electrical response properties, and the specific substrate is Dow Corning 184 polydimethylsiloxane.

[0029] A method for preparing an anisotropic micro-nano structured surface material, comprising the following steps:

[0030] Step 1: Coat a layer of photoresist on the silicon wafer, use photolithography to carve the required "V" structure on the silicon wafer, and make different horizontal and vertical spacing;

[0031] Step 2: Select an elastomer with electrical response properties and mix it evenly with a ratio of 10:1 between the main agent and the curing agent;

[0032] Step 3: Remove air bubbles by vacuuming, place in an electric blast drying oven at 80°C-120°C for 1 hour, and then solidify and form;

[0033] Step 4: Take it out to cool down, and remove the PDMS film from the silicon wafer to obtain a structured PDMS film.

[0034...

Embodiment 2

[0041] A PDMS film with anisotropic wetting properties, including a substrate and the micro-nano material, the substrate is an elastomer with electrical response properties, and the substrate is selected from Dow Corning 184 polydimethylsiloxane, acrylate elastomer, polyurethane Any type of elastomer.

[0042] A method for preparing an anisotropic micro-nano structured surface material, comprising the following steps:

[0043] Step 1: Carve out the required asymmetric structure on the silicon wafer by designing the template, and make different horizontal and vertical spacings. The asymmetric structure is a trapezoidal prism;

[0044] Step 2: Select an elastomer with electrical response properties and mix it uniformly at a ratio of 10:1;

[0045]Step 3: Remove air bubbles by vacuuming, place in an electric blast drying oven at 80°C for 45 minutes, and then solidify and form;

[0046] Step 4: Take it out to cool down, and remove the PDMS film from the silicon wafer to obtain a...

Embodiment 3

[0054] A PDMS film with anisotropic wetting properties, including a substrate and the micro-nano material, the substrate is an elastomer with electrical response properties, and the substrate is selected from Dow Corning 184 polydimethylsiloxane, acrylate elastomer, polyurethane Any type of elastomer.

[0055] A method for preparing an anisotropic micro-nano structured surface material, comprising the following steps:

[0056] Step 1: Carve out the required asymmetric structure on the silicon wafer by designing the template, and make different horizontal and vertical spacings. The asymmetric structure is a trapezoidal prism;

[0057] Step 2: Select an elastomer with electrical response properties and mix it uniformly at a ratio of 10:1;

[0058] Step 3: Remove air bubbles by vacuuming, place in an electric blast drying oven at 80°C for 1 hour, and then solidify and form;

[0059] Step 4: Take it out to cool down, and remove the PDMS film from the silicon wafer to obtain a st...

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Abstract

The invention discloses a liquid transport device on the surface of an electric field responsive elastomer microstructure, comprising a substrate and micro-nano materials, the substrate is an elastomer with electric response performance, and the substrate is selected from Dow Corning 184 polydimethylsiloxane, acrylate Any one of elastomers and polyurethane elastomers. The invention also discloses a liquid transportation method, in which a V-shaped prism with a V-shaped structure is obtained by covering the surface of the elastomer substrate, and an electric field is used to asymmetrically stretch the elastomer substrate with a V-shaped structure, The asymmetric Laplace pressure difference is used to generate the driving force, and the continuous and rapid transport of droplets is realized by continuously repeating this process.

Description

technical field [0001] The invention relates to the field of electric field-induced dielectric elastomer microstructure surface-driven liquid transport, and more specifically relates to a device, preparation method and application for controlling the asymmetric change of surface structure and wettability by electric field-responsive micro-nano materials. Background technique [0002] External field-responsive wettable materials have broad application prospects in liquid transportation, anti-fog and anti-icing, and preparation of microreactors. [0003] At present, studies have shown that surface structure or composition gradients can be achieved through light, electricity, magnetism, external forces, etc., and then surface wettability gradients can be realized, and liquid droplets can be oriented to move, and then applied to liquid transport. The construction of micro-nano structures on the surface greatly increases the hydrophobicity of the surface (see reference [1] Y. Zhe...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B29C41/50B29C41/30B29L7/00B29K83/00
CPCB29C41/003B29C41/30B29C41/50B29K2083/00B29L2007/00
Inventor 田东亮李燕张孝芳刘克松江雷
Owner BEIHANG UNIV
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