Chemical silver plating solution and silver plating method
A technology of electroless silver plating and compounds, applied in the direction of liquid chemical plating, metal material coating process, coating, etc., to achieve good stability, good solderability, and reduce the effect of pre-plating steps
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Embodiment 1
[0047] Electroless silver plating solution includes: silver oxide 1.2g / L; copper ion complexing agent EDTA-2Na 5g / L; pyrrolo[2,3-d:5,4-d']bithiazole 0.5g / L; benzotri Azole 0.05g / L; Polymellitic diphenylimide 0.5g / L; Dibenzopyrrolo[1,2-a][1,8]naphthalene 1.2g / L; Methanesulfonic acid 50ml / L.
[0048] The appearance of the silver layer obtained under the above parameters is smooth and bright, there is no overflow plating on the circuit, the circuit is not blackened, the thickness of the coating is 0.2 microns (2min coating thickness), the stability of the bath solution reaches 6MTO, and the adhesion of the coating by the tape method is good and reaches grade 5 ( 5 stands for excellent, 4 stands for good, 3 stands for poor, 2 stands for poor, 1 stands for very bad), there is no peeling of the metal coating, and if the substrate is not broken, there should be no serious cracking or peeling after bending Phenomenon, when the substrate is not broken, there is no phenomenon of exposi...
Embodiment 2
[0050] Electroless silver plating solution, which includes raw materials with the following concentrations: silver oxide 1.8g / L; copper ion complexing agent EDTA-2Na 20g / L; pyrrolo[2,3-d:5,4-d']bithiazole 1.5g / L; Dibenzopyrrolo[1,2-a][1,8]naphthalene 1.2g / L; Benzotriazole 0.075g / L; Methanesulfonic acid 50ml / L; Diphenylimide 1.0g / L.
Embodiment 3
[0052] Electroless silver plating solution, which includes raw materials with the following concentrations: silver oxide 1.8g / L; copper ion complexing agent EDTA-2Na 15g / L; pyrrolo[2,3-d:5,4-d']bithiazole 1.2g / L; Dibenzopyrrolo[1,2-a][1,8]naphthalene 1.5g / L; Benzotriazole 0.06g / L; Methanesulfonic acid 55ml / L; Diphenylimide 0.75g / L.
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