Multi-band optical exposure system, device and method
An optical exposure and exposure subsystem technology, applied in the field of printed circuit boards, can solve the problems of unstable energy output in the effective band, low lifespan of the coating layer and coating layer, and increased input cost, so as to improve the service life and energy utilization rate, The effect of reducing the cost of use and maintenance, the overall production capacity and the improvement of work efficiency
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Embodiment 1
[0034] This embodiment provides a multi-band optical exposure system, the multi-band optical exposure system includes at least two groups of exposure subsystems, a calibration system and a motion platform;
[0035] The exposure subsystem is used to expose the substrate to be exposed; the calibration system is used to calibrate different exposure subsystems and each optical path in each exposure subsystem in a single direction, on a plane or in a spatial position to achieve different exposures The graphics formed by the subsystem when exposing the substrate to be exposed are superimposed at the same position; the motion platform is used to realize the movement of the substrate to be exposed in a single direction, on a plane or in a spatial position;
[0036] Among them, each group of exposure subsystems matches light sources of different wavelength ranges and optical devices corresponding to different wavelength ranges, and each group of exposure subsystems is set in multi-band ...
Embodiment 2
[0039] This embodiment provides a multi-band optical exposure system, the multi-band optical exposure system includes at least two groups of exposure subsystems, a calibration system and a motion platform;
[0040]The exposure subsystem is used to expose the substrate to be exposed; the calibration system is used to calibrate different exposure subsystems and each optical path in each exposure subsystem in a single direction, on a plane or in a spatial position to achieve different exposures The graphics formed by the subsystem when exposing the substrate to be exposed are superimposed at the same position; the motion platform is used to realize the movement of the substrate to be exposed in a single direction, on a plane or in a spatial position;
[0041] Among them, each group of exposure subsystems matches light sources of different wavelength ranges and optical devices corresponding to different wavelength ranges, and each group of exposure subsystems is set in multi-band ...
Embodiment 3
[0049] This embodiment provides a multi-band optical exposure equipment, please refer to figure 1 , the multi-band optical exposure equipment includes the multi-band optical exposure system described in Embodiment 1 or Embodiment 2;
[0050] In this embodiment, the multi-band optical exposure equipment includes two sets of exposure subsystems, and each set of exposure subsystems matches single-wavelength light sources of different wavelengths for illustration:
[0051] Because the wavelength is different, the interval time required for exposing the substrate to be exposed is also different. In order to make the exposure subsystem of the single-wavelength light source matching different wavelengths expose the solder resist ink, there is a time difference, so that the photochemical reaction is more sufficient. The graphics exposed on the composite photosensitive material have better gloss and higher definition, so the two sets of exposure subsystems are arranged at different pos...
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