High-Q-value resonant-beam structure used as secondary sensitive structure
A technology of sensitive structure and resonant beam, applied in the field of micro-electromechanical systems, can solve the problems of high processing difficulty, low yield and high production cost, and achieve the effects of reducing processing difficulty and cost, high yield and improving Q value
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[0037] The present invention will be described in detail below in conjunction with a specific embodiment and accompanying drawings.
[0038] This embodiment is a high-Q resonant beam structure as a secondary sensitive structure, which is composed of a first resonant beam 1, a second resonant beam 2, a support island and a substrate 3; the support island includes a first support island 11, a second support island The second support island 12, the third support island 21, and the fourth support island 22; the first resonant beam 1 and the second resonant beam 2 are etched from the same layer of raw material, and the structural shape and size are the same, and the thickness direction is the same as that on the substrate 3. The surface is vertical, the width of the beam is greater than the thickness, and the length of the active area of the resonant beam is L. The first support island 11 , the second support island 12 , the third support island 21 , and the fourth support island...
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