Method for preparing high-purity silicon carbide powder

A technology of high-purity silicon carbide powder and high-purity silicon powder, which is applied in chemical instruments and methods, carbon compounds, inorganic chemistry, etc., can solve the problem of low purity of silicon carbide powder, and achieve reduction in quantity and micropipe content, and process Simple, Purity-Enhancing Effects

Inactive Publication Date: 2019-03-22
SICC CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] The present invention aims at the problem that the purity of silicon carbide powder synthesized in the prior art is not high, and provides a kind of preparation method of high-purity silicon carbide powder, and described preparation method comprises the following steps: (1) select high-purity silicon powder and high-purity Carbon powder; (2) primary purification and secondary purification are carried out to high-purity carbon powder, graphite crucible and insulation structure, wherein, primary purification adopts vacuum degassing purification, and secondary purification adopts high-temperature purification under inert gas; (3) will The high-purity carbon powder obtained by the secondary purification of step (2) and the high-purity silicon powder obtained in step (1) are placed in the graphite crucible obtained by the secondary purification of step (2), and react to obtain high-purity silicon carbide powder

Method used

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  • Method for preparing high-purity silicon carbide powder

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Embodiment 1

[0030] A method for preparing high-purity silicon carbide powder, the preparation method comprising the following specific steps:

[0031] (1) Provide high-purity silicon powder and high-purity carbon powder, the molar ratio of high-purity silicon powder and high-purity carbon powder is 0.9;

[0032] (2) The high-purity carbon powder is placed in a graphite crucible, then the graphite crucible and the insulation structure are placed in a heating furnace, and the heating furnace is evacuated so that the vacuum degree reaches 1×10 -4 mbar, heat up to 1000°C for degassing and purification, and last for 8 hours;

[0033] (3) At the temperature described in step (2), inert gas is injected into the heating furnace, and the temperature is slowly raised to 1800° C. for further purification. The purification time is 20 hours to obtain carbon powder with low nitrogen content and low metal impurity content and Graphite crucible and insulation structure;

[0034] (4) the high-purity carbo...

Embodiment 2

[0038] A method for preparing high-purity silicon carbide powder, the preparation method comprising the following specific steps:

[0039] (1) Provide high-purity silicon powder and high-purity carbon powder, the molar ratio of high-purity silicon powder and high-purity carbon powder is 1.2;

[0040] (2) The high-purity carbon powder is placed in a graphite crucible, then the graphite crucible and the insulation structure are placed in a heating furnace, and the heating furnace is evacuated so that the vacuum degree reaches 1×10 -4 mbar, heat up to 1500°C for degassing and purification, and last for 6 hours;

[0041] (3) At the temperature described in step (2), inert gas is injected into the heating furnace, and the temperature is slowly raised to 2300° C. to perform purification again. The purification time is 15 hours, and carbon powder and carbon powder with low nitrogen content and low metal impurity content are obtained. Graphite crucible and insulation structure;

[0...

Embodiment 3

[0046] A method for preparing high-purity silicon carbide powder, the preparation method comprising the following specific steps:

[0047] (1) Provide high-purity silicon powder and high-purity carbon powder, the molar ratio of high-purity silicon powder and high-purity carbon powder is 1.1;

[0048] (2) The high-purity carbon powder is placed in a graphite crucible, then the graphite crucible and the insulation structure are placed in a heating furnace, and the heating furnace is evacuated so that the vacuum degree reaches 1×10 -4 mbar, heat up to 1100°C for degassing and purification, and last for 10 hours;

[0049] (3) At the temperature described in step (2), inert gas is injected into the heating furnace, and the temperature is slowly raised to 1900° C. to perform purification again. The purification time is 15 hours, and carbon powder and carbon powder with low nitrogen content and low metal impurity content are obtained. Graphite crucible and insulation structure;

[...

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Abstract

The invention provides a method for preparing high-purity silicon carbide powder. The method is characterized by comprising the following steps: (1) selecting high-purity silicon powder and high-purity carbon powder; (2) carrying out primary purification and secondary purification on the high-purity carbon powder, a graphite crucible and a heat-insulation structure, wherein the primary purification adopts vacuum degassing purification and the secondary purification adopts high-temperature purification under inert gas; (3) putting the high-purity carbon powder subjected to the secondary purification in step (2) and the high-purity silicon powder in step (1) into the graphite crucible subjected to the secondary purification in step (2); reacting to obtain the high-purity silicon carbide powder. According to the method provided by the invention, the carbon powder, the graphite crucible and the heat-insulation structure are pre-treated, so that the nitrogen content of the high-purity carbon powder and the content of metal impurities are reduced; compared with a method of carrying out wet-process metallurgical treatment after silicon carbide is synthesized, the method is more environmentally friendly and has simpler procedures; meanwhile, impurities are not introduced from the graphite crucible and the heat-insulation structure when the silicon carbide powder is synthesized.

Description

technical field [0001] The invention relates to the technical field of crystal material preparation, in particular to a high-purity silicon carbide powder and a preparation method thereof. Background technique [0002] As one of the most important third-generation semiconductor materials, silicon carbide single crystal is widely used in civil lighting, screens, etc. Display, aerospace, high temperature radiation environment, oil exploration, radar communication and automotive electronics and other fields. Silicon carbide single crystal is usually prepared from silicon carbide powder by sublimation method, so the purity, particle size and crystal form of silicon carbide powder used in sublimation method have a significant impact on the quality of silicon carbide single crystal. [0003] At present, the most commonly used SiC powder synthesis method in production is the self-propagating high-temperature synthesis method, which is to heat high-purity carbon powder and silicon ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B32/963
CPCC01B32/963C01P2006/80
Inventor 靳婉琪热尼亚
Owner SICC CO LTD
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