Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Method for machining butterfly-shaped nanometer gap through coordinative shaping of femtosecond laser phase position amplitude

A nano-slit and femtosecond laser technology, applied in the field of laser applications, can solve problems such as low efficiency, low precision, and unfriendly environment, and achieve the effects of improving processing efficiency, avoiding system errors, and requiring low processing environment

Active Publication Date: 2019-04-09
BEIJING INSTITUTE OF TECHNOLOGYGY
View PDF5 Cites 12 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to solve the problems of low precision, environmental unfriendliness and low efficiency in the existing traditional methods, and provide a method for processing butterfly-shaped nano-slits by using femtosecond laser direct writing in one step

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for machining butterfly-shaped nanometer gap through coordinative shaping of femtosecond laser phase position amplitude
  • Method for machining butterfly-shaped nanometer gap through coordinative shaping of femtosecond laser phase position amplitude
  • Method for machining butterfly-shaped nanometer gap through coordinative shaping of femtosecond laser phase position amplitude

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] A device for implementing a femtosecond laser phase-amplitude cooperative shaping method for processing butterfly-shaped nano-slits, such as figure 1 As shown, it is mainly composed of an energy adjustment device 1 , a reflective phase liquid crystal spatial light modulator 2 , a first plano-convex lens 3 , a second plano-convex lens 4 , a slit device 5 and a focusing objective lens 6 .

[0030] The femtosecond laser amplification stage generates a Gaussian beam, and the beam energy 1 is adjusted by the energy adjustment device, and the energy is 1.1mw. The adjusted light beam is incident on the liquid crystal surface of the reflective phase-type liquid crystal spatial light modulator 2 at a small angle, and the phase loaded by the reflective phase-type liquid crystal spatial light modulator is:

[0031]

[0032] In this embodiment, k=0, n=2.

[0033] The incident beam passes through the spatial light modulator to complete phase shaping, and the shaped beam passes t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a method for machining a butterfly-shaped nanometer gap through coordinative shaping of femtosecond laser phase position amplitude and belongs to the technical field of laserapplication. A reflecting type phase position type liquid crystal spatial light modulator can carry out phase position modulation on incident light, thus reflected light has designated phase positiondistribution on space, meanwhile, a narrow gap is utilized for carrying out amplitude shaping on light beams obtained after phase position shaping, and thus coordinative shaping of the phase positionand the amplitude of the initial light beams is achieved. The light beams obtained after coordinative shaping pass through a focusing objective lens to be focused, and multi-light-point light beams with different structure parameters are formed. The generated multi-light-point light beams are utilized for machining a designated material, material removal can be achieved in the area with strong light intensity, the material is kept in the area with the weak light intensity, and thus the butterfly-shaped nanometer gap can be obtained. According to the method, a light path needing to be set up issimple, use is convenient, a mask and vacuum environment are not needed, the machining cost is low, the machining efficiency is high, and the method plays an important role in the machining field oflaser micro nanometer structures.

Description

technical field [0001] The invention relates to a femtosecond laser phase-amplitude collaborative shaping method for butterfly-shaped nano-slits, belonging to the technical field of laser applications. Background technique [0002] In recent years, nanoslits have broad application prospects in the fields of biosensing, optoelectronics, and nano-optics. Traditional processing methods can be generally divided into two categories. The first category uses traditional methods such as using external mechanical force to generate nanoscale deformation, using electricity to fuse existing nanowires, and electrochemical / chemical deposition. This type of processing method is difficult to obtain. High-precision nano-slits, and the position, size and shape of the generated nano-slits are difficult to control; the second type uses short-wavelength high-energy beams such as ion beams, electron beams, etc. for processing, and this type of processing can obtain high-resolution However, the e...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B23K26/064B23K26/046B23K26/06
CPCB23K26/046B23K26/06B23K26/0648
Inventor 姜澜徐之劼李晓炜
Owner BEIJING INSTITUTE OF TECHNOLOGYGY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com