Method for preparing metal nanostructures by self-absorbing nanoimprinting

Abstract

The present disclosure provides a method for preparing a metal nanostructure through self-priming nanoimprinting. The method comprises the steps that polydimethylsiloxane (PDMS) is used for rollover on the surface of a hard-matrix nanoimprinting template, and a PDMS soft template is obtained; the surface of a substrate is spin-coated with a lower layer of glue, heating and curing are carried out,and the surface of the lower layer of glue is spin-coated with an upper layer of glue; the PDMS soft template is overlaid on the surface of the upper layer of glue, the upper layer of glue is heated and cured, the PDMS soft template is removed, and a grating structure is obtained; if being negative glue, the upper layer of glue is baked after being exposed, and if being positive glue, the upper layer of glue is not exposed; the upper layer of glue and the lower layer of glue on the substrate form a downfall structure by development; and metal is evaporated, the lower layer of glue, the upper layer of glue and metal located on the upper layer of glue are stripped through a stripping process, and the metal nanostructure is formed.

Description

Technical field [0001] The present disclosure relates to the technical field of micro-nano manufacturing, in particular to a method for preparing metal nano-structures by self-absorption nano-imprinting. Background technique [0002] With the development of nanoscience, its application extends to various fields, especially the preparation of nanostructures has gradually become a research hotspot. As early as 1995, Professor Zhou Yu, a Chinese scientist at Princeton University, proposed nanoimprint technology for the limitation of the exposure wavelength of the lithography process. The nano pattern on the template was imprinted on the substrate. The nanoimprint technology saved the lithography process. It can break the diffraction limit and prepare nanostructures in a large area. This technology has aroused the interest of many researchers, has been widely studied and applied, and has become a new generation of nanomanufacturing technology, which is applied in various fields of th...

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Problems solved by technology

The high-temperature heating and cooling process will prolong the imprinting cycle and reduce the output rate, while high-pressure molding will increase template loss and limit the application of substrate materials that cannot withstand high pressure. Professional imprinting equipment is required to provide large-area uniform pressure and high temperature, expensive

In UV-cured nanoimprinting, the polymer is no longer heated and cooled to shape, but is cured by ultraviolet radiation. In order to make the template and the substrate fully bonded, it is necessary to apply a pressure above atmospheric pressure, which also requires expensive imprinting equipment. Auxiliary to prepare uniform

In actual imprinting, the structure of the imprinting glue is usually a positive mesa structure, which cannot complete the steam gold stripping process. Usually, nanoimprinting on the gold film and etching gold are used to complete the preparation of the gold nanostructure. This method costs High, and the etched gold sidewall is rough

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