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Vaporization system and storage medium storing vaporization system program

一种气化系统、气化气体的技术,应用在气态化学镀覆、化学仪器和方法、化学/物理过程等方向,能够解决维护性变差、妨碍低成本化和紧凑化、价格高等问题

Active Publication Date: 2019-05-14
HORIBA STEC CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, when a pressure sensor is installed on the gasification gas flow path, it is necessary to make the pressure sensor resistant to high temperature, and this type of pressure sensor is expensive and large, which prevents cost reduction and compactness
[0005] In addition, for example, when performing calibration such as zero point correction of the pressure sensor, there is a problem that the air compressor needs to be cleaned, resulting in poor maintainability

Method used

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  • Vaporization system and storage medium storing vaporization system program
  • Vaporization system and storage medium storing vaporization system program
  • Vaporization system and storage medium storing vaporization system program

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Embodiment Construction

[0040] One embodiment of the gasification system of the present invention will be described below with reference to the drawings.

[0041] The gasification system 100 of this embodiment is installed in, for example, a semiconductor production line, etc., and is used to supply a predetermined flow rate of gas to a chamber in which a semiconductor manufacturing process is performed, such as figure 1 As shown, it includes: a gasification part 2, which vaporizes the liquid raw material; a mass flow controller 3, which controls the flow rate of the gas gasified by the gasification part 2; and a control device 4, which controls the gasification part 2 and mass flow control The action of device 3.

[0042] In addition, in this embodiment, each part constituting the vaporizer 2 is housed in the first case C1, and each part constituting the mass flow controller 3 is housed in the second case C2 different from the first case C1. Each part constituting the vaporization part 2 and each ...

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PUM

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Abstract

A vaporization system and a storage medium storing a vaporization system program are provided which can properly control liquid material supply without a pressure sensor. The vaporization system (100)includes a vaporizer (21) that vaporizes the liquid material; a supply amount controller (22) that controls the supply amount of the liquid material to the vaporizer (21); a flow rate regulation valve (32) that regulates the flow rate of vaporized gas produced by the vaporizer (21); a flow rate sensor that measures the flow rate of the vaporized gas; and a valve control part (43) that outputs a drive signal to the flow rate regulation valve (32) to control a valve opening level so that a measured flow rate measured by the flow rate sensor becomes equal to a predetermined set flow rate. The system also includes a drive signal value acquiring unit (44) adapted to acquire a drive signal value that is a value indicated by the drive signal; and a supply controller (45) outputting control signals to the supply amount controller (22) based on the drive signal value so as to control supply of the liquid material.

Description

technical field [0001] The present invention relates to a vaporization system for vaporizing a liquid material and a storage medium storing a program for the vaporization system used in the vaporization system. Background technique [0002] Conventionally, as an apparatus for generating gas used in a semiconductor manufacturing process such as a film forming process, as disclosed in Patent Document 1, a vaporization system that vaporizes a liquid material has been used. [0003] Such a gasification system includes a gasification system in which a pressure sensor is provided on a flow path of gasification gas generated by a gasifier to monitor the pressure in the gasifier. Therefore, when the pressure in the vaporizer decreases with the decrease of the liquid material in the vaporizer and falls below a threshold value, supplying the liquid material to the vaporizer prevents the liquid material in the vaporizer from being depleted, or when the gasifier When the pressure gas i...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/448H01L21/67
CPCC23C14/246C23C14/543C23C16/4485C23C16/52B01J4/008B01J7/02B01B1/005B01D1/0082H01L21/67017H01L21/6715C23C14/24C23C14/54
Inventor 田口明広姜山亮一
Owner HORIBA STEC CO LTD
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