Method for processing copper-graphene composite nanometer pattern through electron beams

A technology of graphene compounding and electron beam processing, which is applied in nanotechnology, photosensitive material processing, photolithographic exposure devices, etc., can solve the problems of no ultra-small-scale nanocomposite material patterning, high processing cost, and harsh processing conditions. , to achieve excellent mechanical properties and electrical and thermal conductivity, reduce production costs, and reduce the effects of processing procedures
CN109765760AInactive Publication Date: 2019-05-17杭州欧克液压科技有限公司
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Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
杭州欧克液压科技有限公司
Publication Date
2019-05-17
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention discloses a method for processing a copper-graphene composite nanometer pattern through electron beams. The method comprises the steps: firstly, a layer of copper naphthenate thin film is rotatably smeared on a provided substrate; a sample is exposed through an electron beam exposure technology and developed, and then a preset copper naphthenate nanometer pattern is obtained; and then the sample is annealed to obtain the nanometer pattern of a copper-graphene composite material. The defect that traditional micronano processing cannot manufacture the composite material nanostructure pattern with the extremely small feature size is overcome, and meanwhile, metal deposition is not needed, so that the production cost is lowered.
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Description

technical field

[0001] The invention relates to the field of micro-nano manufacturing, in particular to a method for processing copper-graphene composite nano-patterns with electron beams. Background technique

[0002] With the rapid development of nanotechnology, nano-optics and nano-electronics, the research of electron beam exposure nano-processing technology is particularly important, and the traditional preparation method of nano-structure graphics is mainly divided into three steps: (1) using electron beam processing technology Defining the nano-pattern on the photoresist; (2) depositing a layer of functional material on the photoresist nano-pattern structure or directly etching; (3) removing the remaining photoresist to complete the transfer of the nano-structure pattern. The traditional processing method has cumbersome steps, harsh processing conditions and high processing cost, especially it cannot process composite nano-patterns.

[0003] Copper and copper alloys ...

Claims

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