Standard sample preparation method for synchronous radiation confocal fluorescence experiment
A confocal and fluorescent technology, which is applied in the direction of material analysis using radiation, material analysis using wave/particle radiation, and measuring devices, can solve problems such as error effects and achieve high-precision results
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[0023] Below in conjunction with the drawings, preferred embodiments of the present invention are given and described in detail.
[0024] see Figure 1-4 , the present invention, that is, a method for preparing a standard sample for synchrotron radiation confocal fluorescence experiments, comprising the following steps:
[0025] Step S101, deposit a copper film 12 with a thickness of 5-20 nm (preferably 5 nm) on the entire top surface of the silicon substrate 11 by magnetron sputtering, molecular beam epitaxy, etc., and place the silicon film 12 with the copper film 12 The substrate 11 is cut into a length of 3-7mm (preferably 5mm), and a width of 0.8-1.2mm (preferably 1mm); (such as figure 1 shown)
[0026] Step S102, etching the copper film 12 and the silicon substrate 11 with a partial thickness adjacent to the copper film 12 by ion beam etching, so that their widths are reduced to form a copper film with a width of 50-200 μm (preferably 100 μm) Strip 13 and first substr...
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