Composite type filtered arc ion plating with composite magnetic field and lined bias voltage stepped tube

Abstract

The invention discloses a composite type filtered arc ion plating with a composite magnetic field and a lined bias voltage stepped tube, and belongs to the technical field of material surface treatment. The problems of contamination of thin films by large particles and loss in the process of plasma transmission in a multistage magnetic field filter device are solved. A device comprises bias voltage power supply, an arc ion plating target source and power supply, a multistage magnetic field device and power supply, a lined bias voltage stepped tube device and bias voltage power supply, a movable coil device and power supply, a sample table, a bias voltage power supply waveform oscilloscope, and a vacuum chamber; and thin film deposition is conducted, specifically, the device is connected, asystem is started, working gas is injected when the vacuum degree in a vacuum chamber is less than 10<-4> Pa, a plating power supply is turned on, energy of arc plasma is regulated by using the biasvoltage power supply, large particle defects in the arc plasma are eliminated and the transmission efficiency in the filter device is improved through the lined bias voltage stepped tube device and the multistage magnetic field device, the loss in the vacuum chamber is reduced, technological parameters are set, and thin film preparation is conducted.

Description

technical field [0001] The invention relates to an arc ion plating combined with a magnetic field and an inner-lined bias stepped tube for composite filtering, and belongs to the technical field of material surface treatment. Background technique [0002] In the process of preparing thin films by arc ion plating, due to the arc spot current density as high as 2.5~5×10 10 A / m 2 , causing molten liquid metal to appear at the arc spot position on the target surface, which is splashed out in the form of droplets under the action of local plasma pressure, and adheres to the surface of the film or is embedded in the film to form "macroparticles" (Macroparticles) Defects (BoxmanR L, Goldsmith S. Macroparticle contamination in cathodic arc coatings: generation, transport and control [J]. Surf Coat Tech, 1992, 52(1): 39-50.). In the arc plasma, since the movement speed of electrons is much greater than that of ions, the number of electrons reaching the surface of large particles pe...

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Problems solved by technology

[0004] The purpose of the present invention is to solve the problem that the traditional arc ion plating method adopts high melting point target material, low melting point pure metal or multi-element alloy material and non-metallic material (such as graphite) as the target material, which is easy to produce large particle defects, and the curved magnetic filter technology causes arc. Low plasma transmission efficiency, limited use of target elements, uniform target ablation, film deposition density and defects, vacuum chamber space and deposition position limitations, workpiece shape limitations, and residues of different targets in multi-level magnetic field devices Combining the multi-level magnetic field filtering method and the composite effect of the mechanical barrier shielding of the lined bias ladder tube device's own shape and the bias electric field attraction to eliminate the large particles contained in the arc plasma At the same time, ensure that the arc plasma passes through the lined bias stepped tube device and the multi-stage magnetic field filter device with high transmission efficiency, and then use the movable coil device to control the transmission from the multi-stage magnetic field device and the lined bias stepped tube device The transmission direction of the arc plasma in the vacuum chamber realizes the control and adjustment of the film deposition and film composition on the surface of the substrate workpiece at any position in the vacuum chamber, and overcomes the limitation of the deposition position or the shape of the substrate caused by the design of the vacuum chamber space and target source layout. The problem of uneven film deposition can completely remove the large particle defects that may remain in the arc plasma transmitted from the multi-level magnetic field device and the lined bias stepped tube device, so that the surface of the workpiece can be adjusted under the condition of applying a negative bias voltage. Ion energy, to prepare continuous and dense high-quality films, and at the same time realize the control of the content of target elements in the film, reduce the production cost of using alloy targets, improve the transmission efficiency of arc plasma, increase the deposition speed of films and reduce or even eliminate large particles The adverse effects of defects on the microstructure of thin films, continuous dense deposition and performance, proposed a combined magnetic field and lined bias stepped tube compound filter arc ion plating

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