Combined magnetic field and lining biased straight pipe composite filtering arc ion plating

Abstract

The invention discloses combined magnetic field and lining biased straight pipe composite filtering arc ion plating, and belongs to the technical field of material surface treatment. The combined magnetic field and lining biased straight pipe composite filtering arc ion plating solves the problem of contamination to thin films by macroparticles in a multi-stage magnetic field filtering device andloss of plasma during transfer. A device of the combined magnetic field and lining biased straight pipe composite filtering arc ion plating comprises a grid bias power supply, an arc ion plating target source and power supply, a multi-stage magnetic field device and power supply, a lining biased straight pipe device and grid bias power supply, a movable coil device and power supply, a sample stage, a bias power waveform oscilloscope and a vacuum chamber. Thin film deposition comprises the steps that the devices are connected, a system is started, when the vacuum degree in the vacuum chamber isless than 10<-4> Pa, working gas is introduced in, a film coating power supply is turned on, energy of the arc plasma is adjusted by the grid bias power supply, macroparticle defects in the arc plasma are eliminated and the transfer efficiency in the filtering device is improved through the lining biased straight pipe device and the multi-stage magnetic field device, the loss in the vacuum chamber is reduced, process parameters are set, and thin film preparation is performed.

Description

technical field [0001] The invention relates to an arc ion plating combined with a magnetic field and a liner bias straight tube compound filter, and belongs to the technical field of material surface treatment. Background technique [0002] In the process of preparing thin films by arc ion plating, due to the arc spot current density as high as 2.5~5×10 10 A / m 2 , causing molten liquid metal to appear at the arc spot position on the target surface, which is splashed out in the form of droplets under the action of local plasma pressure, and adheres to the surface of the film or is embedded in the film to form "macroparticles" (Macroparticles) Defects (BoxmanR L, Goldsmith S. Macroparticle contamination in cathodic arc coatings: generation, transport and control [J]. Surf Coat Tech, 1992, 52(1): 39-50.). In the arc plasma, since the movement speed of electrons is much greater than that of ions, the number of electrons reaching the surface of large particles per unit time is...

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Problems solved by technology

[0004] The purpose of the present invention is to solve the problem that the traditional arc ion plating method adopts high melting point target material, low melting point pure metal or multi-element alloy material and non-metallic material (such as graphite) as the target material, which is easy to produce large particle defects, and the curved magnetic filter technology causes arc. Low plasma transmission efficiency, limited use of target elements, uniform target ablation, film deposition density and defects, vacuum chamber space and deposition position limitations, workpiece shape limitations, and residues of different targets in multi-level magnetic field devices Combining the multi-stage magnetic field filtering method and the constraints of the shape of the lined bias straight tube device and the composite effect of bias electric field attraction to eliminate the large particle defects contained in the arc plasma, At the same time, ensure that the arc plasma passes through the lined bias straight pipe device and the multi-stage magnetic field filter device with high transmission efficiency, and then use the movable coil device to control the arc plasma transmitted from the multi-stage magnetic field device and the lined bias straight pipe device The transmission direction of the body in the vacuum chamber realizes the control and adjustment of the film deposition and film composition on the surface of the substrate workpiece at any position in the vacuum chamber, and overcomes the limitation of the deposition position or the shape of the substrate caused by the vacuum chamber space and target source layout design. The problem of uneven deposition can completely remove the large particle defects that may remain in the arc plasma transmitted from the multi-level magnetic field device and the lined bias straight tube device, so that the ion energy can be adjusted on the surface of the workpiece under the condition of applying a negative bias voltage , to prepare continuous, dense and high-quality films, and at the same time realize the control of the content of target elements in the film, reduce the production cost of using alloy targets, improve the transmission efficiency of arc plasma, increase the deposition speed of films, and reduce or even eliminate the impact of large particle defects on The adverse effects of film microstructure, continuous dense deposition and service performance, proposed a combined magnetic field and lined bias straight tube composite filter arc ion plating

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