Solar cell Al grid line structure and preparation method thereof
A solar cell and grid line technology, applied in circuits, electrical components, photovoltaic power generation, etc., can solve the problems of reducing the light-receiving area of the battery, large contact metal composite, and high resistivity
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[0035] Such as figure 1 As shown, the solar cell Al grid line structure of the present invention includes a sub-grid line, and the sub-grid line includes a contact hole formed on the passivation layer / anti-reflection layer 102 of the P-type doped region 101 of the solar cell, Print non-burn-through aluminum paste on the contact hole as the sub-grid bottom layer 103 and the aluminum paste completely covers the contact hole below, and overprint a layer of linear silver paste on the sub-grid bottom layer 103 as the sub-grid top layer 104 ; The auxiliary gate line is connected to the main gate line 105 .
[0036] In this embodiment, the silicon substrate 100 can be either N-type or P-type; the P-type doped region 101 is located on the front side of the battery or on the backside of the battery, and the P-type doped region 101 completely or partially covers the silicon wafer substrate 100. On the surface, the P-type doped region 101 can be P-type doped crystalline silicon, P-type ...
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