Z-mechanism Bi2O3@CeO2 photocatalyst rich in oxygen vacancy, and preparation method and application thereof

A photocatalyst, oxygen vacancy technology, applied in the field of photocatalysis, can solve the problems of high photo-generated electron-hole recombination rate and low utilization rate of photocatalyst, achieve high catalytic degradation activity, fast degradation rate, improve electrical conductivity and oxidation effect of ability

Active Publication Date: 2019-08-16
SHAANXI NORMAL UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, β-Bi 2 o 3 Photocatalysts have a high photogenerated electron-hole recombination rate, result

Method used

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  • Z-mechanism Bi2O3@CeO2 photocatalyst rich in oxygen vacancy, and preparation method and application thereof
  • Z-mechanism Bi2O3@CeO2 photocatalyst rich in oxygen vacancy, and preparation method and application thereof
  • Z-mechanism Bi2O3@CeO2 photocatalyst rich in oxygen vacancy, and preparation method and application thereof

Examples

Experimental program
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Example Embodiment

[0031] Example 1

[0032] Oxygen vacancy-rich Z-mechanism Bi 2 O 3 @CeO 2 The preparation method of photocatalyst, it comprises the steps:

[0033] 1) Prepare the reaction solution

[0034] a. Dissolve 2g of cerium nitrate hexahydrate in 60mL of deionized water to form a uniform solution, then add 0.8g of acrylamide and 1.8g of glucose and stir for 20 minutes to prepare a cerium nitrate solution;

[0035] b. The Bi (NO 3 ) 3 ·5H 2 O is dissolved in the ethylene glycol solution and stirred for 20 minutes until the solution is uniform to prepare a bismuth nitrate solution;

[0036] 2) Slowly drop the bismuth nitrate solution prepared in step 2) into the cerium nitrate solution prepared in step 1) according to the atomic ratio of Ce:Bi=1:0.04, and stir for 20 minutes, using ammonia with a volume concentration of 5%. The pH of the aqueous solution was adjusted to 10, and after stirring for 3 hours, the solution was transferred into a stainless steel reactor and subjected t...

Example Embodiment

[0041] Example 2

[0042] Different from Example 1, the oxygen vacancy-rich Z-mechanism Bi prepared in this example 2 O 3 @CeO 2 The preparation method of photocatalyst comprises the following steps:

[0043] 1) Prepare the reaction solution

[0044] a. Dissolve 2.5g of cerium nitrate hexahydrate in 50mL of deionized water to form a uniform solution, then add 1g of acrylamide and 1.6g of glucose and stir for 28 minutes to prepare a cerium nitrate solution;

[0045] b. The Bi (NO 3 ) 3 ·5H 2 O is dissolved in the ethylene glycol solution and stirred for 26 minutes until the solution is uniform to prepare a bismuth nitrate solution;

[0046] 2) Slowly drop the bismuth nitrate solution prepared in step 2) into the cerium nitrate solution prepared in step 1) according to the atomic ratio of Ce:Bi=1:0.04, stir for 26 minutes, and use ammonia with a volume concentration of 7%. The pH of the aqueous solution was adjusted to 10, and after stirring for 2.5 hours, the solution w...

Example Embodiment

[0050] Example 3

[0051] Different from Example 1 and Example 2, the oxygen vacancy-rich Z-mechanism Bi prepared in this example 2 O 3 @CeO 2 The preparation method of photocatalyst comprises the following steps:

[0052] 1) Prepare the reaction solution

[0053] a. Dissolve 3g of cerium nitrate hexahydrate in 60mL of deionized water to form a uniform solution, then add 1.2g of acrylamide and 2g of glucose and stir for 30 minutes to prepare a cerium nitrate solution;

[0054] b. The Bi (NO 3 ) 3 ·5H 2 O is dissolved in the ethylene glycol solution and stirred for 30 minutes until the solution is uniform to prepare a bismuth nitrate solution;

[0055] 2) Slowly drop the bismuth nitrate solution prepared in step 2) into the cerium nitrate solution prepared in step 1) according to the atomic ratio of Ce:Bi=1:0.05, stir for 30 minutes, and use ammonia with a volume concentration of 5.5%. The pH of the aqueous solution was adjusted to 11, and after stirring for 3 hours, th...

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Abstract

The invention provides a Z-mechanism Bi2O3@CeO2 photocatalyst rich in oxygen vacancy, a preparation method and application of same, and belongs to the technical field of photocatalysis. The method comprises the following steps: 1) preparing a reaction solution; 2) preparing a catalyst precursor solution; 3) under the protection of N2, calcining the precursor solution in a tubular furnace at a hightemperature to prepare an intermediate Bi@CeO2; and 4) preparing the Z-mechanism Bi2O3@CeO2 photocatalyst rich in oxygen vacancy. The catalyst is of a globular flower shaped structure by attaching nanosheet-shaped Bi2O3 to globular flower shaped CeO2 particles. The photocatalyst can be applied to degradation of NOx in air under the condition of visible light, is high in degradation rate and longin activity retention time, and the yield of an intermediate product NO2 is low. Products formed by degradation are low in toxicity or non-toxic, so that secondary pollution to the air is avoided.

Description

technical field [0001] The invention belongs to the technical field of photocatalysis, in particular to a Z-mechanism Bi that is rich in oxygen vacancies 2 o 3 @CeO 2 Photocatalyst and its preparation method and application. Background technique [0002] Atmospheric Pollutants SOx, Nox and CO 2 Degradation of phospholipids has always been a matter of concern to people, because they not only bring huge challenges to the environment, but also seriously endanger human health and pose a huge challenge to future economic development. Photocatalytic oxidation technology is one of the efficient and green ways to degrade pollutants, usually with TiO 2 ,CeO 2 ,ZnO,WO 3 Such semiconductors are used as photocatalysts, but these photocatalysts have poor electrical conductivity and weak oxidation ability due to their weak photoresponsive ability and low carrier separation and transfer efficiency. [0003] CeO 2 As a traditional photocatalyst, because of its high efficiency, non-t...

Claims

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Application Information

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IPC IPC(8): B01J23/18B01D53/86B01D53/56B01J35/08B01J35/10
CPCB01J23/002B01J23/18B01J35/004B01D53/8628B01J35/023B01J35/08B01J35/1019
Inventor 孙辉聂俊丽朱刚强
Owner SHAANXI NORMAL UNIV
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