Sub-nanoscale mandrel for manufacturing grazing-incidence reflection lens by replication and manufacturing process
A sub-nano-scale, manufacturing process technology, applied in the field of ultra-smooth sub-nano-scale mandrel manufacturing process, can solve the problems of large-area collection of X-rays, difficult surface roughness of nickel-phosphorus alloys, low X-ray reflection efficiency, etc. , to achieve the effect of ensuring surface quality, reducing processing costs and ensuring precision
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment
[0072] Using this manufacturing process to process a certain size of double reflection grazing incidence precision mandrel, as attached Figure 2b ) As shown in the figure, the maximum diameter of the mandrel is D max =114mm, minimum diameter D min =100.524mm, total length of mandrel L=330mm, diameter of blind hole d=65mm, depth of blind hole h=300mm. After mandrel rough machining, stability treatment, precision machining, ultra-precision turning, then electroless nickel plating with a thickness of 80-90μm, ultra-precision turning to a surface roughness of 9nm, and then magnetorheological modification and polishing, the surface roughness can reach 0.75-0.9nm, and finally manual conformal smooth polishing.
[0073] Implementation effect: After processing, the precision of the grazing incidence mandrel can reach 1 μm, and the surface roughness of the white light interferometer can reach RMS 0.4nm. At the same time, the mandrel has been used as a mold to replicate and process u...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com