Nitride multi-junction solar cell and preparation method thereof
A solar cell and nitride technology, applied in the field of solar cells, can solve the problem of absorbing a large number of ultraviolet photons, and achieve the effect of improving light conversion rate and promoting absorption
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0027] see figure 1 , the present embodiment provides a nitride multi-junction solar cell, comprising an InN bottom cell 1, an AlN nucleation layer one 2, a Si sub-cell 3, an AlN nucleation layer two 4, a GaN buffer layer 5, and an InGaN top cell arranged in sequence 6. The current diffusion layer 7 and the quantum dot material layer 8 arranged on the current diffusion layer, the InN bottom cell 1 includes an n-type InN layer 11 and a p-type InN layer 12, and the Si sub-cell 3 includes an n-type Si layer 31 and p-type Si layer 32. The InGaN top cell 6 includes an n-type InGaN layer 61 and a p-type InGaN layer 62. In this implementation, the n-type InGaN layer 61 is n-type In 0.33 Ga 0.67 N layer, p-type InGaN layer 62 is p-type In 0.33 Ga 0.67 N layer, in the present embodiment, the current diffusion layer 7 is an ITO layer, and the material used in the quantum dot material layer 8 is CdS quantum dots, and a negative electrode 91 is arranged at the bottom of the InN bottom ...
Embodiment 2
[0040] see figure 2 , the present embodiment provides a nitride multi-junction solar cell, comprising an InN bottom cell 1, an AlN nucleation layer 1, a Si sub-cell 3, an AlN nucleation layer 2 4, a GaN buffer layer 5, and a BInGaN layer 10 arranged in sequence , an InGaN top cell 6, a current diffusion layer 7 and a quantum dot material layer 8 disposed on the current diffusion layer, the InN bottom cell 1 includes an n-type InN layer 11 and a p-type InN layer 12, and the Si sub-cell 3 includes an n-type Si layer 31 and a p-type Si layer 32, and the InGaN top cell 6 includes an n-type InGaN layer 61 and a p-type InGaN layer 62. In this embodiment, the n-type InGaN layer 61 is n-type In 0.33 Ga 0.67 N layer, p-type InGaN layer 62 is p-type In 0.33 Ga 0.67 N layer, in the present embodiment, the current diffusion layer 7 is an ITO layer, and the material used in the quantum dot material layer 8 is CdS quantum dots, and a negative electrode 9 is arranged at the bottom of the...
Embodiment 3
[0044] This embodiment provides a nitride multi-junction solar cell In 0.28 Ga 0.72 N / Si / InN, the preparation steps are the same as in Example 2, except that the InGaN top cell grown in step (3) includes n-type In 0.28 Ga 0.72 N-layer and n-type In 0.28 Ga 0.72 N layers.
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com