Method for integrating silicon-based lithium niobate thin film electro-optic modulator arrays

An electro-optic modulator, silicon-based lithium niobate technology, applied in light guides, optics, instruments, etc., can solve the problems of lower conversion rate of electro-optic modulation, low modulation efficiency of doped silicon, high half-wave voltage, etc., to ensure functional effectiveness and stability, improving preparation efficiency, and the effect of ultra-high modulation bandwidth

Active Publication Date: 2019-08-23
交芯科(上海)智能科技有限公司
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Problems solved by technology

However, the use of doped silicon as a light-guiding medium has the following problems: doped silicon has an absorption effect on light, which will significantly increase the insertion loss of the electro-optic modulator; the modulation efficiency of doped silicon is low, so the designed half-w

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  • Method for integrating silicon-based lithium niobate thin film electro-optic modulator arrays
  • Method for integrating silicon-based lithium niobate thin film electro-optic modulator arrays
  • Method for integrating silicon-based lithium niobate thin film electro-optic modulator arrays

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[0036] The technical solution of the present invention will be described in detail below with reference to the drawings and embodiments, and detailed implementation and structure are given, but the protection scope of the present invention is not limited to the following embodiments.

[0037] See figure 1 , figure 1 It is a partial structural diagram of an embodiment of a lithium silicon-based lithium niobate thin film electro-optic modulator array of the present invention. The integration method of the present invention's lithium silicon-based lithium niobate thin film electro-optic modulator array includes the following steps:

[0038] 1) Oxidize the silicon oxide film layer 3 on the smooth silicon crystal substrate 2 by thermal oxidation method;

[0039] 2) Using chemical vapor deposition (CVD) to deposit a certain thickness of polysilicon on the silicon oxide film layer 3, and then dry or wet etching to form a plurality of silicon-based lithium niobate thin film electro-optic mo...

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Abstract

The object of the present invention is to provide a method for integrating large-scale silicon-based lithium niobate thin film electro-optic modulator arrays in view of the deficiencies of the prior art. By using the method, the preparation process difficulty of the lithium niobate crystal layers is reduced, the precision requirement for the bonding of lithium niobate and silicon is reduced, and the preparation and bonding of the large-scale array-type lithium niobate crystal layers can be simultaneously completed at one time, so that production efficiency of the lithium-based lithium niobatethin film electro-optic modulator arrays is greatly improved; by structurally designing and optimizing the silicon crystal layer, the light can be naturally alternated and mutually transmitted in thesilicon waveguide and the lithium niobate waveguide, so that a high-performance lithium niobate film electro-optic modulation effect is achieved; and in addition, the advantages of standardized silicon-based integration technology maturity are used in the method, and the complex chip preparation process is concentrated on the silicon crystal layer, so that the process error in the chip fabricationprocess can be reduced, and performance stability of the entire silicon-based lithium niobate film electro-optic modulator array is ensured.

Description

technical field [0001] The invention relates to the technical field of optoelectronic integrated devices, in particular to a silicon-based lithium niobate thin-film electro-optic modulator array integration method. [0002] technical background [0003] The electro-optic modulator loads the electrical signal onto the optical signal, and is the signal input interface of optical signal processing systems such as optical communication and microwave photonic radar. Its performance directly determines the performance of the optical signal processing system, so it has become a very important photonic device. In order to realize an integrated electro-optic modulator on a chip, an electro-optic modulator using a standardized silicon-based integration process has emerged (see Document 1: Ding Jianfeng, Zhang Lei, Yang Lin, "Silicon-based integrated differential electro-optic modulator and its preparation method", National invention patent CN105044931B, 2015). Using doped silicon as ...

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Application Information

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IPC IPC(8): G02B6/132G02B6/136G02B6/12G02B6/125G02F1/035
CPCG02B6/12G02B6/125G02B6/132G02B6/136G02B2006/1204G02B2006/12142G02B2006/1215G02B2006/12159G02B2006/12176G02F1/035
Inventor 邹卫文徐绍夫王静陈建平
Owner 交芯科(上海)智能科技有限公司
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