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An etching solution composition for silver-containing layer and a manufacturing method for an array substrate for display device using the same

A technology of etching solution and composition, which is applied in the manufacture of semiconductor/solid-state devices, electrical components, electric solid-state devices, etc., can solve the problems of decreased stability over time, and achieve improved stability over time, reduction of silver residue and re-adsorption , silver residue and excellent re-adsorption effect

Inactive Publication Date: 2019-09-27
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In connection with this, conventionally, a method of etching a thin film containing silver using an etchant composition containing phosphoric acid, acetic acid, and nitric acid (Korean Patent Laid-Open Publication No. 10-0579421) has been developed. There is a problem of decreased stability over time due to the strong volatility of acetic acid

Method used

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  • An etching solution composition for silver-containing layer and a manufacturing method for an array substrate for display device using the same
  • An etching solution composition for silver-containing layer and a manufacturing method for an array substrate for display device using the same

Examples

Experimental program
Comparison scheme
Effect test

experiment example

[0049] By depositing an organic insulating film on the substrate, and on the insulating film with A three-layer film of ITO / Ag / ITO was deposited to form a plate, and the plate was cut into 500×600 mm with a diamond knife to prepare a sample.

[0050] The performance test was performed in the following manner using the etching solution compositions of the above-mentioned Examples 1-6 and Comparative Examples 1-3.

experiment example 1

[0051] Experimental example 1: About the effect of flatness

[0052] Add the etching solution compositions of the above-mentioned Examples 1 to 6 and Comparative Examples 1 to 3 respectively into the experimental equipment of the jet etching method (model name: ETCHER (TFT), K.C. Tech Company), and set the temperature to 40°C Afterwards, the temperature is raised, and then the spray etching equipment is operated after the temperature reaches 40±0.1° C., so that the etching solution is continuously circulated in the spray etching equipment. The etching process of the sample was performed at the time of 6 hours and the time of 12 hours after the temperature reached 40±0.1° C., respectively.

[0053] The total etching time was set to 85 seconds and implemented.

[0054] Spraying was started after placing the substrate, and after 85 seconds of etching time had elapsed, the substrate was taken out, washed with deionized water, and then dried with a hot air drying device. After cl...

Embodiment 2

[0059] Example 2: Measuring the side erosion distance

[0060] Add the etching solution compositions of the above-mentioned Examples 1 to 6 and Comparative Examples 1 to 3 respectively into the experimental equipment of the jet etching method (model name: ETCHER (TFT), K.C. Tech Company), and set the temperature to 40°C Afterwards, the temperature is raised, and then the spray etching equipment is operated after the temperature reaches 40±0.1° C., so that the etching solution is continuously circulated in the spray etching equipment. The etching process of the sample was performed at the time of 6 hours and the time of 12 hours after the temperature reached 40±0.1° C., respectively. The total etching time was set to 85 seconds and implemented.

[0061] Spraying was started after placing the substrate, and after 85 seconds of etching time had elapsed, the substrate was taken out, washed with deionized water, and then dried using a hot air drying device. The substrate was cut ...

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Abstract

The present invention relates to an etching solution composition for a silver-containing thin film and a manufacturing method for an array substrate for a display device using the same. Based on the total weight of the etching liquid composition, the etching liquid composition comprises: 30 to 60 w% of phosphoric acid; 1 to 9 wt% of nitric acid; 0.1 to 10 wt% of ferric nitrate; 0.1 to 10 wt% of a carboxylic acid-based organic acid excluding acetic acid; and the balance of water, thereby improving time stability and overcoming a tip generation problem of a transparent conductive film during etching of the silver-containing thin film, representing an excellent effect of remarkably reducing silver residues and readsorption and achieving excellent flatness.

Description

technical field [0001] The invention relates to an etchant composition containing a silver thin film and a method for manufacturing an array substrate for a display device using the composition. Background technique [0002] With the advent of the true information age, the field of display devices for processing and displaying a large amount of information is rapidly developing, and accordingly, various flat panel displays have been developed and attracted attention. [0003] Examples of such flat panel display devices include liquid crystal display devices (Liquid crystal display device: LCD), plasma display devices (Plasma Display Panel device: PDP), field emission display devices (Field Emission Display device: FED), organic Light-emitting diodes (Organic Light Emitting Diodes: OLED) and the like. [0004] As an example, since OLED elements emit light by themselves and can be driven at low voltage, OLEDs are rapidly being used in the market of small display devices such ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/30H01L21/77
CPCC23F1/30H01L27/1259C09K13/06H01L29/7869H01L29/78618H10K59/123H10K59/1213
Inventor 权五柄张晌勋崔亨燮
Owner DONGWOO FINE CHEM CO LTD
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