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Wafer cutting machine and wafer edge cutting method

A cutting method and wafer technology, applied in semiconductor/solid-state device testing/measurement, work accessories, electrical components, etc., can solve problems such as low wafer yield, inability to meet product diversification, and poor machine performance. Achieve the effect of satisfying diversification and improving machine performance

Active Publication Date: 2021-08-03
ICLEAGUE TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, the existing commercial wafer cutting machine has a single function and only includes a wafer edge trimming unit and a wafer cleaning unit
However, the design and process conditions of the products are different, so that the existing wafer cutting machines cannot meet the needs of product diversification.
For example, when the product design and process conditions are different, different wafers are required to have different edge cutting widths, but the current commercial wafer cutting machine can only hang a single-size cutting chip (Dicing blade), when switching the width of edge cutting, it may be necessary to replace the machine, or replace the cutting blades hanging on the machine, the performance of the machine is not good
[0006] Moreover, the yield rate of wafers processed by wafer cutting machines in the prior art is low, which greatly affects the subsequent wafer processing flow.

Method used

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  • Wafer cutting machine and wafer edge cutting method
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  • Wafer cutting machine and wafer edge cutting method

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Embodiment Construction

[0025] A wafer cutting machine and a wafer edge cutting method proposed by the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0026] see Figures 1 to 3 ,in figure 1 It is a schematic structural diagram of a wafer cutting machine in a specific embodiment of the present invention, figure 2 It is a structural schematic diagram of the cutting piece and the rotating head of the wafer cutting machine in a specific embodiment of the present invention, image 3 It is a schematic diagram of the connection relationship of the wafer cutting machine in a specific embodiment of the present invention.

[0027] In this specific embodiment, a wafer cutting machine is provided, including: cutting pieces 101 of at least two sizes for cutting the wafer 105, and the cutting width of each cutting piece 101 is different; The head 102 includes a first surface 201 for facing the wafer 105 to be cut, all the cu...

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Abstract

The invention relates to a wafer cutting machine and a wafer edge cutting method, wherein the wafer cutting machine includes: cutting pieces of at least two sizes for cutting wafers, and the cutting width of each cutting piece is Each is different; the rotating head includes a first surface for facing the wafer to be cut, all the cutting blades are detachably mounted on the first surface, and the rotating head can rotate around a The linear rotation of the surface changes the cutting blade for cutting the wafer. The above wafer cutting machine and wafer edge cutting method have at least two cutting blades, which can complete various wafer edge cutting requirements in the same machine, meet the diverse needs of wafer manufacturing processes, and improve machine performance. And it can detect the cutting edge of the wafer in time during cutting, and only take out the edge of the cut wafer after it meets the requirements, so it will not affect the subsequent wafer manufacturing process.

Description

technical field [0001] The invention relates to the field of wafer processing and manufacturing, in particular to a wafer cutting machine and a wafer edge cutting method. Background technique [0002] With the advent of the 3D chip era, edge trimming (edge ​​trimming) technology is also increasingly important. [0003] In the existing technology, it is necessary to use technical means such as grinding, polishing, etching, etc. to thin the wafer to a thickness of several microns, and during the thinning process, it is easy to break the wafer and reduce the yield of the wafer. A large part of this problem is caused by poor bonding between the outer edge of the wafer and the vicinity of the circumference and the carrier substrate. Due to poor bonding between the vicinity of the above-mentioned edge and the carrier substrate, the wafer cannot receive sufficient support from the carrier substrate to resist the stress from the grinding or transfer process, causing cracks in the p...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B28D5/04B28D7/00H01L21/67H01L21/66
CPCB28D5/0058B28D5/0064B28D5/042H01L21/67092H01L22/12H01L22/20
Inventor 余兴
Owner ICLEAGUE TECH CO LTD