C3N5 material as well as preparation method and application thereof
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- CHENGDU UNIVERSITY OF TECHNOLOGY
- Publication Date
- 2019-10-18
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Abstract
Description
technical field
[0001] The present invention relates to C 3 N 5 The material and its preparation method and application belong to the technical field of photocatalysis. Background technique
[0002] Photocatalytic technology is a technology that uses photocatalysts to catalyze reactions under light irradiation. It is a green technology that has important application prospects in the fields of energy and the environment. Photocatalyst is the key to photocatalytic technology. It is a general term for chemical substances that can play a catalytic role under the excitation of photons. Semiconductor photocatalysts can be excited to generate electrons and holes under the irradiation of light, and redox reactions occur on the semiconductor surface. So as to realize the decomposition of water or the decomposition of organic pollutants, and realize the utilization and conversion of light energy.
[0003] As a new type of semiconductor material, C 3 N 5 It has become a research h...