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Method of managing coating uniformity with an optical thickness monitoring system

An optical monitoring and uniformity technology, applied in coating, metal material coating process, vacuum evaporation plating, etc., can solve the lack of consistency and repeatability of shielding masks, low reproducibility of test results, and shielding masks Inconvenient fine-tuning and other issues

Inactive Publication Date: 2019-10-18
程实平
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  • Summary
  • Abstract
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Fabrication and testing of traditional block masks is time consuming
Fine-tuning the shape of the shielding mask is very inconvenient, if not impossible
This can lead to missing the best shape for good uniformity
Additionally, test results were less reproducible due to the lack of consistency and repeatability of hand-prepared shielding masks

Method used

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  • Method of managing coating uniformity with an optical thickness monitoring system
  • Method of managing coating uniformity with an optical thickness monitoring system

Examples

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example 1

[0039] Two thin film coating materials, a high index material and a low index material, need to be applied to the substrate. The multi-channel optical monitoring system consists of two laser channels. The spot (R1) of channel 1 is located at radius R1 of the substrate and the spot (R2) of channel 2 is at radius R2. R1 is greater than R2. The light transmittance of channel 1 and channel 2 are T (1) and T (2) . Because the substrate rotates during the deposition process, the light spot R1 or R2 represents an annular region on the substrate.

[0040] There are four adjustable masks on a multi-mask set. Masks HP and HN are used to vary the uniformity of the coating comprising high refractive index material (high refractive index coating). Mask HP positively regulates uniformity by making the deposition rate at R1 greater than that at R2. Mask HN negatively regulates uniformity by making the deposition rate at R1 less than the deposition rate at R2. The other two masks LP a...

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Abstract

The subject matter of the invention is a method for managing the coating thickness on a substrate in a physical vapor deposition system. The method is applied to the system that comprises a multi-beamlaser monitoring system and a uniformity control system with a multi-mask set. Said method comprises steps of computing error function for transmission of laser passing through the coating layer, ceasing the deposition process based on the comparison between the error function and a predetermined constant, comparing deposition rates among all laser beams, identifying the area of the coating layerwith a different deposition rate, adjusting the multi-mask set to modify the deposition rate on that coating area in the next deposition process, and resuming the deposition process for the next coating layer until uniformity of the coating thickness is reached.

Description

Background technique [0001] Physical vapor deposition (PVD) plays an important role in today's mass production coating process. PVD is characterized by the process in which the coating material changes from the condensed phase (also known as the target material) to the gas phase in an environment of high vacuum and high temperature, and then changes back to the substrate (the product or material to be coated). ) on the condensed film. Compared with traditional coating methods such as electroplating process, PVD coating is more corrosion-resistant and durable. Furthermore, it can be applied to more diverse substrates and surfaces. [0002] However, maintaining the uniformity of coating thickness during PVD deposition has been a challenge. The method used in industry to manage coating thickness is to insert one or more shielding masks between the substrate and the evaporation source of the coating material. Placing a shadow mask in the PVD coating chamber helps the evaporate...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/54C23C14/04
CPCC23C14/042C23C14/547C23C14/044C23C14/24
Inventor 程实平
Owner 程实平