Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Fluorescent quantitative internal reference genes of elymus sibiricus under different stress conditions and primer and application thereof

An internal reference gene and fluorescence quantitative technology, applied in the field of plant molecular biology, can solve the problems of less research on stress resistance genes of old awn wheat

Pending Publication Date: 2019-10-22
LANZHOU UNIVERSITY
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] At present, there are few studies on the stress resistance genes of old mans wheat under different stress conditions

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Fluorescent quantitative internal reference genes of elymus sibiricus under different stress conditions and primer and application thereof
  • Fluorescent quantitative internal reference genes of elymus sibiricus under different stress conditions and primer and application thereof
  • Fluorescent quantitative internal reference genes of elymus sibiricus under different stress conditions and primer and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] 1. Test material

[0040] The test material is the ZHN03 wild old mango wheat germplasm collected from Zhuoni County, Gansu Province (see Table 1 for specific information). After the seeds of the ZHN03 germplasm were placed in a petri dish to germinate for 2-3 weeks, the seedlings were transplanted into a flower pot (10 cm in diameter), and the peat soil, vermiculite and sand (volume ratio: 2:2:1). The plant materials were cultivated in the artificial intelligence greenhouse of Yuzhong Campus of Lanzhou University, where the day and night temperature was 28 / 14°C and the relative air humidity was 30%, and they were cultivated under conventional management for 3 months. Before stress treatment, healthy plants with similar growth were selected, and the plants were taken out from the soil and transferred to 1 times Hoagland nutrient solution for two weeks before stress treatment. 250mmol / L NaCl and 20% PEG6000 were used for salt stress and drought stress treatment, and th...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides fluorescent quantitative internal reference genes of elymus sibiricus under different stress conditions. The internal reference genes are TBP2, ACT2 and DNAJ, the nucleotide sequence of the internal reference gene TBP2 is SEQ ID NO.1, the nucleotide sequence of the internal reference gene ACT2 is SEQ ID NO.2, and the nucleotide sequence of the internal reference gene DNAJ isSEQ ID NO.3. The three internal reference gene sequences are from elymus sibiricus transcriptome sequences, and have higher specificity and stability than general internal reference genes of other species. Meanwhile, the three internal reference genes are screened out and are the most stable internal reference genes of elymus sibiricus under different stress treatments, the data is real and reliable, and a foundation can be laid for deeply excavating functional genes of elymus sibiricus in a later period. Not only is the problem solved that no internal reference gene exists in the existing elymus sibiricus gene expression analysis, but also the detection efficiency and the reliability of detection results can be improved.

Description

technical field [0001] The invention belongs to the technical field of plant molecular biology, and in particular relates to a fluorescent quantitative internal reference gene under different stress conditions of old awn wheat, primers and applications thereof. Background technique [0002] Old mans wheat (Elymus sibiricus L.) is a perennial herbaceous plant of the genus Elymus in the Triticeae family of the family Poaceae, and is a model species of the genus Elymus. Old awn wheat is widely distributed in temperate regions of the northern hemisphere, and it is also an important part of meadow steppe and alpine meadow communities in my country. Due to its strong cold resistance, high grass quality, and good palatability, the old awn wheat has become one of the fine forages widely used in the national "Natural Protection Project" and "Returning Grassland to Grass Project". [0003] With global climate change, many factors such as high and low temperature, salinity and other s...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C12Q1/6895C12Q1/6851C12N15/11
CPCC12Q1/6851C12Q1/6895C12Q2600/13C12Q2600/166C12Q2563/107C12Q2531/113C12Q2545/101
Inventor 谢文刚张俊超张宗瑜郑玉莹王彦荣
Owner LANZHOU UNIVERSITY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com