A method for manufacturing an indium tin oxide thin film, a display panel, and a display device
A technology of indium tin oxide and its production method, which is applied in the direction of gaseous chemical plating, coating, electric solid devices, etc., can solve the problems of indium tin oxide film disconnection, abnormal display of liquid crystal panels, etc., and achieve improved display effect, Improves density and eliminates broken wires
Active Publication Date: 2022-02-18
HKC CORP LTD +1
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Problems solved by technology
[0003] In the manufacture of the display panel, when the insulating protective layer is etched to form a via hole so that the transparent conductive layer is connected to the drain, the insulating protective layer may have undercut phenomenon (PV Under-cut, Passivation Undercut), and then through PVD (Physical When Vapor De-position, physical vapor deposition method) deposits ITO (Indium Tin Oxides, indium tin oxide film), due to undercutting, the indium tin oxide film is prone to disconnection, which may directly lead to liquid crystal panel in severe cases. Display Error
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[0036] It should be understood that the terminology and specific structural and functional details disclosed herein are representative only for describing specific embodiments, but the application can be embodied in many alternative forms and should not be construed as merely Be limited by the examples set forth herein.
[0037] In the description of the present application, the terms "first" and "second" are used for descriptive purposes only, and cannot be understood as indicating relative importance, or implicitly indicating the quantity of indicated technical features. Therefore, unless otherwise specified, the features defined as "first" and "second" may explicitly or implicitly include one or more of these features; "plurality" means two or more. The term "comprising" and any variations thereof mean non-exclusive inclusion, possible presence or addition of one or more other features, integers, steps, operations, units, components and / or combinations thereof.
[0038] Al...
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The application discloses a method for manufacturing an indium tin oxide film, a display panel and a display device. The manufacturing method of the indium tin oxide thin film, the manufacturing method includes: a step of forming an indium oxide thin film; a step of forming a tin oxide thin film; If the preset number of times is yes, then the manufacturing process is completed; otherwise, the step of forming the indium oxide film and the tin oxide film is performed again. This application uses atomic layer deposition technology to alternately form indium oxide films and tin oxide films, and finally obtain indium tin oxide films, which greatly improves the density, surface smoothness and uniformity of deposited films, and realizes the formation of stable indium tin oxide film.
Description
technical field [0001] The present application relates to the field of display technology, in particular to a method for manufacturing an indium tin oxide thin film, a display panel and a display device. Background technique [0002] Display panels have been rapidly developed and widely used in recent years. As far as TFT-LCD (ThinFilm Transistor-LCD, Thin Film Transistor-LCD) on the mainstream market includes an array substrate and a color filter substrate, a thin film transistor is formed on the array substrate, and the thin film transistor controls the switch of the pixel electrode, and the thin film transistor is turned on. When the pixel electrode generates a voltage, the liquid crystal molecules are deflected and the picture is displayed. [0003] In the manufacture of the display panel, when the insulating protective layer is etched to form a via hole so that the transparent conductive layer is connected to the drain, the insulating protective layer may have undercut...
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IPC IPC(8): C23C16/455C23C16/40H01L27/12
CPCC23C16/45529C23C16/407H01L27/124
Inventor 夏玉明卓恩宗
Owner HKC CORP LTD