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Clean water grinding and polishing technology

A process, clean water technology, used in grinding/polishing equipment, abrasives, manufacturing tools, etc., can solve the problems of little silicon crystal and cermet materials, improve the leveling and bright effect, improve mechanical strength and wear resistance improve the performance of grinding and polishing

Active Publication Date: 2019-11-19
海南亿鑫和科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But at present, the polishing and grinding disc of polyurethane matrix is ​​mainly used in the field of glass, and there is little involvement of silicon crystal and cermet materials

Method used

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Experimental program
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preparation example Construction

[0116] In a preferred embodiment, the preparation method of polyurethane of the present invention comprises the following steps:

[0117] The raw materials for preparing the polyurethane described in the present invention are blended to obtain the polyurethane.

[0118] The second aspect of the present invention provides a method for preparing a polishing grinding disc as described above, comprising the following steps:

[0119] The polyurethane, the grinding agent and the solvent are mixed to obtain a colloid, the base cloth is soaked in the colloid, solidified, washed with water and dried to obtain the polishing grinding disc.

[0120] Preferably, the colloid of the present invention further includes a dispersant.

[0121] More preferably, the dispersant of the present invention accounts for 0.5-1 wt% of the colloid.

[0122] Further preferably, the dispersant of the present invention accounts for 0.8wt% of the colloid.

[0123] More preferably, the dispersant of the pres...

Embodiment 1

[0149] Embodiment 1 of the present invention provides a kind of clear water grinding and polishing process, comprises the following steps:

[0150] The first stage is to carry out 25min coarse grinding using the coarse grinding and polishing grinding disc, which includes 65wt% coarse grinding abrasive; the second stage is to use the fine grinding and polishing grinding disc to carry out 20min fine grinding, and the fine grinding and polishing The grinding disc includes 65wt% fine grinding abrasive; the third stage is polishing for 15 minutes using a fine polishing and polishing grinding disc, which includes 80wt% fine polishing abrasive.

[0151] The coarse grinding abrasive is green silicon carbide with a mesh number of 800 mesh; the fine grinding abrasive is zirconia with a mesh number of 3000; the fine polishing abrasive is cerium oxide with a particle size of 25 nm.

[0152] The polishing grinding disc comprises rough grinding polishing grinding disc, fine grinding polishi...

Embodiment 2

[0160] Embodiment 2 of the present invention provides a kind of clean water grinding and polishing process, comprises the following steps:

[0161] The first stage is to carry out 25min coarse grinding using the coarse grinding and polishing grinding disc, which includes 65wt% coarse grinding abrasive; the second stage is to use the fine grinding and polishing grinding disc to carry out 20min fine grinding, and the fine grinding and polishing The grinding disc includes 65wt% fine grinding abrasive; the third stage is polishing for 15 minutes using a fine polishing and polishing grinding disc, which includes 80wt% fine polishing abrasive.

[0162] The coarse grinding abrasive is green silicon carbide with a mesh number of 800 mesh; the fine grinding abrasive is zirconia with a mesh number of 3000; the fine polishing abrasive is cerium oxide with a particle size of 25 nm.

[0163] The polishing grinding disc comprises rough grinding polishing grinding disc, fine grinding polishi...

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Abstract

The invention relates to the technical field of grinding and polishing, in particular to a clean water grinding and polishing technology. The clean water grinding and polishing technology comprises the following steps that in the first stage, coarse grinding is conducted for 20-30 minutes by using a coarse grinding and polishing disc, wherein the coarse grinding and polishing disc comprises a coarse grinding agent; in the second stage, fine grinding is conducted for 15-25 minutes by using a fine grinding and polishing disc, wherein the fine grinding and polishing disc comprises a fine grindingagent; and in the third stage, polishing is conducted by using a fine polishing and grinding disc for 5-15 minutes, wherein the fine polishing and grinding disc comprises a fine polishing grinding agent. According to the clean water grinding and polishing technology, grinding and polishing can be carried out under the condition that only clean water is used, environmental pollution caused by grinding powder or slurry containing a grinding agent is avoided, and harm to human health is avoided. The technology can be applied to materials such as glass, silicon crystals and metal ceramic, and canachieve a series of operations such as coarse grinding, fine grinding and fine polishing, so that the leveling and brightening effects of the materials are improved.

Description

technical field [0001] The invention relates to the technical field of grinding and polishing, and more specifically, the invention relates to a clear water grinding and polishing process. Background technique [0002] As commonly used materials at present, glass, silicon crystal and cermet materials are widely used. In order to improve the smoothness or brightness of these materials, grinding and polishing is a very important process. At present, abrasives such as carbides and oxides are usually used. Such as silicon carbide, cerium oxide as the main components of grinding and polishing powder or slurry for processing, but these substances in the form of powder or liquid have certain shortcomings in operability and efficiency, and it is easy to cause a large amount of abrasive Waste, and cumbersome procedures and processes, low efficiency, high cost, in addition, non-degradable abrasives will also pollute the environment, and some abrasives are corrosive, which will also en...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24B1/00B24B41/04B24D3/00
CPCB24B1/00B24B41/04B24D3/00
Inventor 和晓宇和洪喜和俊卿赵宝春
Owner 海南亿鑫和科技有限公司
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