A Multilevel Ionized Rotating Magnetic Field Accelerated Helicon Wave Plasma Source
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- BEIHANG UNIV
- Publication Date
- 2021-12-28
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Abstract
Description
technical field
[0001] The invention belongs to the field of plasma sources, and in particular relates to a plasma that uses helicon discharge plasma as the first-order ionization source, uses a multi-level stepped contraction ionization structure, and uses a magnetic confinement structure and a rotating magnetic field acceleration structure to accelerate the plasma. A multi-stage ionizing rotating magnetic field accelerates a helicon wave plasma source. Background technique
[0002] The helicon wave plasma source is a device that can efficiently convert radio frequency wave energy into high-density plasma through an antenna system without electrode contact. It has a variety of propellants (oxygen-enriched gas or air), no electrodes (long life), high ionization rate (nearly 100% in the central area), high density (10 17 -10 20 m -3 ), low magnetic field confinement (<0.1T), high controllability (multi-mode operation), and other significant advantages, it is very suitab...