Testing device and testing method for optical uniformity of biaxial crystal in principal axis direction

Abstract

The invention discloses a testing device and a testing method for optical uniformity of a biaxial crystal in a principal axis direction. The testing device comprises a light source, a condensing lens,a collimating lens, a polarizer, a phase compensator, an analyzer, an imaging lens and a camera which are sequentially arranged in the direction of an optical axis, wherein a crystal to be tested isarranged between the phase compensator and the analyzer, the phase compensator is composed of two optical wedges, phase retardation is adjusted by adjusting the relative positions of the two optical wedges, and the optical wedges are made of crystals of which components are the same as that of the crystal to be tested and have good optical uniformity. The testing device is simple in structure, lowin cost and convenient to maintain. Compared with a traditional testing method, the testing method has the advantages that the testing method does not need to test background interference and interferograms formed by lasers in different polarization states passing through the crystal repeatedly, is little affected by the environment, has high test efficiency and is suitable for batch production and detection; and the method is simple to operate, has low processing requirements on the tested crystal, and is easy to popularize and use.

Description

Technical field [0001] The invention relates to the detection of the optical uniformity of a crystal, in particular to a testing device and a testing method for the optical uniformity of the biaxial crystal spindle direction. Background technique [0002] Crystal materials are widely used in modern laser systems for frequency conversion and phase modulation. The uniformity of the crystal directly determines the performance of the laser system. It can be seen that the optical uniformity is an important indicator for evaluating the quality of the crystal. In the process of crystal growth, inevitably due to the influence of gravity, temperature, impurities and other factors, the crystal has structural defects and the optical uniformity decreases. Therefore, an indispensable step when using crystalline materials to make optical devices is to test the optical uniformity of the material and select areas that can be reasonably used for processing. [0003] At present, the main method of ...

AI Technical Summary

Problems solved by technology

Although this method has high test accuracy, there are many inconveniences in using this test method in the production of crystal optical devices: first, this test method requires expensive equipment, which directly leads to an increase in detection costs; The quality of the operators has put forward extremely high requirements, and the testing conditions are relatively harsh; moreover, the testing steps are cumbersome, and the interference generated by the reflection of the cavity and the front and rear surfaces of the crystal needs to be tested in sequence before the test to eliminate background interference

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