Method for In Situ Fabrication of Titanium Dioxide Thin Films Exposing High Energy Crystal Facets

A titanium dioxide, in-situ preparation technology, applied in the field of materials, can solve problems such as difficulty in recycling, inability to expose the effective surface of titanium dioxide, application restrictions, etc., and achieve good performance results

Active Publication Date: 2022-04-05
ZHEJIANG UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The {001} crystal surface exposed anatase titanium dioxide reported in the literature is generally a powder particle, and the powder particle has the disadvantages that it cannot be fixed and is difficult to recycle, which limits its application, including photocatalysis, biomaterials and other fields.
Especially when titanium dioxide that needs to be attached to the substrate is used as a catalyst, the combination of titanium dioxide and the substrate is difficult, the effective surface of titanium dioxide cannot be exposed, and the catalytic efficiency is low

Method used

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  • Method for In Situ Fabrication of Titanium Dioxide Thin Films Exposing High Energy Crystal Facets
  • Method for In Situ Fabrication of Titanium Dioxide Thin Films Exposing High Energy Crystal Facets
  • Method for In Situ Fabrication of Titanium Dioxide Thin Films Exposing High Energy Crystal Facets

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0049] The method for in-situ preparation of anatase-type titanium dioxide thin film with high-energy {001} crystal plane exposure provided in this example includes the following steps:

[0050] (1) Annealing pretreatment of titanium sheet: cut 10×8mm 2 The titanium substrate was washed alternately with acetone and ethanol, each time for 5 min, 3 cycles, and then 3 times with deionized water. Afterwards, the titanium sheet was annealed at 450°C for 1.5 hours, cleaned in the same way after taking it out, and dried at room temperature for later use.

[0051] (2) prepare 200mL of reaction precursor solution, use ammonium fluotitanate as titanium source, the concentration of ammonium fluotitanate is 3.25mM, the concentration of hydrofluoric acid is 65mM, the concentration of boron oxide is 65mM; The ratio is 1:1, and the molar ratio of ammonium fluotitanate to hydrofluoric acid is 1:20.

[0052] (3) Put the precursor solution and the titanium sheet into a stainless steel autocla...

Embodiment 2

[0054] The method for in-situ preparation of anatase-type titanium dioxide thin film with high-energy {001} crystal plane exposure provided in this example includes the following steps:

[0055] (1) Annealing pretreatment of titanium sheet: cut 15×12mm 2 The titanium substrate was washed alternately with acetone and ethanol, each time for 5 min, 3 cycles, and then 3 times with deionized water. Afterwards, the titanium sheet was annealed at 450°C for 1.5 hours, cleaned in the same way after taking it out, and dried at room temperature for later use.

[0056] (2) Prepare 300mL of reaction precursor solution, use ammonium fluorotitanate as the titanium source, the concentration of ammonium fluorotitanate is 4.5mM, the concentration of hydrofluoric acid is 90mM, and the concentration of boron oxide is 180mM; The ratio is 1:2, and the molar ratio of ammonium fluotitanate to hydrofluoric acid is 1:20.

[0057] (3) Put the precursor solution and the titanium sheet into a stainless ...

Embodiment 3

[0059] The method for in-situ preparation of anatase-type titanium dioxide thin film with high-energy {001} crystal plane exposure provided in this example includes the following steps:

[0060] (1) Annealing pretreatment of titanium sheet: cut 20×16mm 2 The titanium substrate was washed alternately with acetone and ethanol, each time for 5 min, 3 cycles, and then 3 times with deionized water. Afterwards, the titanium sheet was annealed at 450°C for 1.5 hours, cleaned in the same way after taking it out, and dried at room temperature for later use.

[0061] (2) Prepare 400mL of reaction precursor solution, use ammonium fluotitanate as titanium source, the concentration of ammonium fluotitanate is 6.5mM, the concentration of hydrofluoric acid is 130mM, the concentration of boron oxide is 1300mM; The ratio is 1:10, and the molar ratio of ammonium fluotitanate to hydrofluoric acid is 1:20.

[0062] (3) Put the precursor solution and the titanium sheet into a stainless steel aut...

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Abstract

The method of in-situ preparation of high-energy crystal surface exposed titanium dioxide thin film, obtaining the substrate, and annealing the substrate, cleaning and drying the annealed substrate for later use; preparing the reaction precursor liquid, the reaction precursor liquid is composed of titanium source, hydrofluoric acid and Boron oxide is obtained by uniform mixing; the reaction precursor and the substrate are put into a stainless steel high-pressure reactor at the same time for hydrothermal reaction to obtain a sample with a titanium dioxide film on the surface, and the sample after taking out is ultrasonically cleaned in deionized water and dried at room temperature; The obtained sample is defluoridated at a high temperature, then immersed in water to cool, and finally dried to obtain a matrix of anatase titanium dioxide film exposed by a high-energy {001} crystal plane; the purpose of the present invention is to provide a A method for growing anatase-type titanium dioxide thin films with uniform morphology, intact crystal form, and exposed {001} crystal planes.

Description

technical field [0001] The invention relates to the field of material technology, in particular to a method for in-situ preparation of anatase-type titanium dioxide film exposed by a high-energy {001} crystal plane. Background technique [0002] Due to its good chemical and physical stability, environmental friendliness, abundant resources, and excellent photocatalytic performance, anatase titanium dioxide crystals are very important in photocatalytic water splitting, solar cells, photocatalytic degradation of organic matter, and biosensors. application. In the above-mentioned applications in these fields, the performance of the anatase titanium dioxide thin film crystal mainly depends on the surface morphology of the crystal, especially its crystal plane. Therefore, the method of artificially controlling the synthesis of specific anatase-type titanium dioxide crystal faces has attracted extensive attention. Anatase titanium dioxide crystal mainly consists of three crystal...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01G23/053
CPCC01G23/053C01P2002/72C01P2004/03C01P2002/30C01P2004/02
Inventor 肖帆陈燚云姜珍兰
Owner ZHEJIANG UNIV OF TECH
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