Method for regulating and controlling wettability of rough copper surface through surface thermal oxidation
A technology of wetting performance and copper surface, applied in liquid chemical plating, coating, metal material coating process, etc., can solve the problems of difficult control of copper surface wettability and high cost, and achieve strong bonding force, suitable for Wide-ranging, environmentally friendly effects
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Embodiment 1
[0040] This embodiment relates to a method for regulating the wettability of a rough copper surface by surface thermal oxidation, comprising the following steps:
[0041] Step 1, cutting the C194 cold-rolled copper strip into required size, namely 70mm×50mm;
[0042] Step 2, put the cut substrate into the electrolytic degreasing solution with a current density of 5.0A / dm 2 , the degreasing time is 30s;
[0043] Step 3, soak the degreasing and cleaned substrate in 20% sulfuric acid solution for 30s, take it out and wash it with deionized water, this step is to remove the surface oxide and expose the fresh substrate at the same time;
[0044] Step 4, hanging the substrate into the plating solution prepared with deionized water for chemical deposition;
[0045] The composition of the plating solution is: copper sulfate pentahydrate (analytical pure, Sinopharm Chemical Reagent Co., Ltd., 0.03mol L -1 ); nickel sulfate hexahydrate (analytical pure, Sinopharm Chemical Reagent Co....
Embodiment 2
[0050] This embodiment relates to a method for regulating the wettability of a rough copper surface by surface thermal oxidation, comprising the following steps:
[0051] Step 1, cutting the C194 cold-rolled copper strip into required size, namely 70mm×50mm;
[0052] Step 2, put the cut substrate into the electrolytic degreasing solution with a current density of 1.0A / dm 2 , the degreasing time is 200s;
[0053] Step 3, soak the substrate after degreasing and cleaning in 15% nitric acid solution for 35s, take it out and wash it with deionized water, this step is to remove the surface oxide and expose the fresh substrate at the same time;
[0054] Step 4, hanging the substrate into the plating solution prepared with deionized water for chemical deposition;
[0055] The composition of the plating solution is: copper sulfate pentahydrate (analytical pure, Sinopharm Chemical Reagent Co., Ltd., 0.03mol L -1 ); nickel sulfate hexahydrate (analytical pure, Sinopharm Chemical Reage...
Embodiment 3
[0060] This embodiment relates to a method for regulating the wettability of a rough copper surface by surface thermal oxidation, comprising the following steps:
[0061] Step 1, cutting the C194 cold-rolled copper strip into required size, namely 70mm×50mm;
[0062] Step 2, put the cut substrate into the electrolytic degreasing solution with a current density of 10.0A / dm 2 , the degreasing time is 20s;
[0063] Step 3, soak the degreasing and cleaned substrate in 30% hydrochloric acid solution for 40s, take it out and wash it with deionized water, this step is to remove the surface oxide and expose the fresh substrate;
[0064] Step 4, hanging the substrate into the plating solution prepared with deionized water for chemical deposition;
[0065] The composition of the plating solution is: copper sulfate pentahydrate (analytical pure, Sinopharm Chemical Reagent Co., Ltd., 0.04mol L -1 ); nickel sulfate hexahydrate (analytical pure, Sinopharm Chemical Reagent Co., Ltd., 0.00...
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