Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Etching device

An etching device and a technology to be etched, which are applied in the processing of photosensitive materials, etc., can solve the problems affecting the personal health and safety of operators, the etching time is difficult to control, and uncontrollable safety hazards, etc., so as to shorten the time of etching process, etch Good effect, realize the effect of semi-automatic production

Pending Publication Date: 2020-02-07
SBT ULTRASONIC TECH CO LTD
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this way, the rotation speed of the anvil is unstable during the etching process, and the etching time is not easy to control, resulting in unstable etching effect and affecting the quality of finished products
In addition, since the etchant is a highly corrosive chemical liquid, the operator's hands are often in direct contact with the etchant, which will bring uncontrollable safety hazards and affect the personal health and safety of the operator

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Etching device
  • Etching device
  • Etching device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0041] In order to make the technical problems solved by the present invention, the technical solutions adopted and the technical effects achieved clearer, the technical solutions of the embodiments of the present invention will be further described in detail below in conjunction with the accompanying drawings. Obviously, the described embodiments are only the technical solutions of the present invention. Some, but not all, embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative efforts fall within the protection scope of the present invention.

[0042] In the description of the present invention, unless otherwise clearly specified and limited, the terms "connected", "connected" and "fixed" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integrated ; It can be a mechanical connection or an electrical connection; it can be a direct...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention belongs to the technical field of anvil block production and processing, and discloses an etching device. The etching device comprises a box body used for containing etching liquid, an opening being formed in one side of the box body; a driving member, which is arranged on the box body; and a transmission assembly, of which one end is connected to the output end of the driving member, and the other end is detachably connected to a workpiece to be etched. The driving member is configured to drive the workpiece to be etched to rotate through the transmission assembly to make the peripheral surface of the workpiece to be etched covered with etching liquid. Compared with the prior art, the etching device realizes uniform and effective etching of the workpiece to be etched in therotary motion process of the workpiece to be etched through mutual cooperation of the driving member and the transmission assembly; etching effect is good, and the quality of a finished product is improved; and meanwhile, the time of the etching process in the production process of the workpiece to be etched is shortened, and semi-automatic production is realized, so that the working efficiency is improved.

Description

technical field [0001] The invention relates to the technical field of anvil block production and processing, in particular to an etching device. Background technique [0002] Etching is also called photochemical etching, which refers to removing the protective film of the area to be etched after exposure plate making and development, and contacting chemical solution during etching to achieve the effect of dissolution and corrosion, forming the effect of concave-convex or hollow molding. [0003] The anvil is generally used in the process of seam welding in the new energy industry. During the production and processing of the anvil, the operator needs to manually place the anvil in the chemical liquid and rotate it to complete the etching process. In this way, the rotation speed of the anvil is unstable during the etching process, and the etching time is difficult to control, resulting in unstable etching effect and affecting the quality of the finished product. In addition,...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/42
CPCG03F7/42
Inventor 周宏建何相平
Owner SBT ULTRASONIC TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products