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A kind of tungsten-nickel alloy target material and its preparation method

A tungsten-nickel alloy and target technology, applied in metal material coating process, vacuum evaporation coating, coating and other directions, can solve the problem of affecting the quality of electrochromic layer, uneven distribution of nickel elements in the target, affecting product sputtering problems such as radiation performance, etc., to achieve the effect of easy purchase, high yield and high density

Active Publication Date: 2022-03-04
安泰天龙钨钼科技有限公司 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The currently used tungsten-nickel target is manufactured by thermal spraying process, the sputtering target density is only about 90%, and the nickel element in the target is unevenly distributed, which affects the sputtering performance of the product, thereby affecting the quality of the electrochromic layer
Patent CN105849633A uses powder mixing, forming, sintering and forging processes to prepare tubular targets, and the density can reach 99.97%. However, due to the use of forging process, the prepared alloy microstructure will have certain grain orientation

Method used

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  • A kind of tungsten-nickel alloy target material and its preparation method
  • A kind of tungsten-nickel alloy target material and its preparation method
  • A kind of tungsten-nickel alloy target material and its preparation method

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Experimental program
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Effect test

Embodiment 1

[0033] (1) Raw material preparation: Mix tungsten powder with a particle size of 2.0 μm and a weight percentage of 40%, and nickel powder with a particle size of 2.3 μm and a weight percentage of 60% in a mixer for 8 hours, and mix them uniformly to obtain a mixed powder for use ;

[0034] (2) Cold isostatic pressing: put the mixed powder into a soft rubber film, put it into a cold isostatic press and press to form, the isostatic pressure is 150MPa, the holding time is 12 minutes, and the mixed powder is isostatic pressed Finally, a preform with a relative density of 55% is obtained;

[0035] (3) Sintering: Sinter the preform under a hydrogen protective atmosphere at a sintering temperature of 1300°C and a holding time of 1 hour to obtain a sintered billet;

[0036] (4) Hot isostatic pressing treatment: the sintered billet is subjected to hot isostatic pressing treatment under an argon atmosphere at a temperature of 1000° C., a pressure of 80 MPa, and a holding time of 1 hour...

Embodiment 2

[0041] (1) Raw material preparation: Mix tungsten powder with a particle size of 3.0 μm and a weight percentage of 86%, and nickel powder with a particle size of 3.5 μm and a weight percentage of 14% in a mixer for 20 hours, and mix them uniformly to obtain a mixed powder for use ;

[0042] (2) Cold isostatic pressing: put the mixed powder into a soft rubber film, put it into a cold isostatic press and press to form, the isostatic pressure is 220MPa, the holding time is 25 minutes, and the mixed powder is isostatic pressed Finally, a preform with a relative density of 65% is obtained;

[0043] (3) Sintering: sintering the preform under a hydrogen protective atmosphere at a sintering temperature of 1500°C and a holding time of 3 hours to obtain a sintered billet;

[0044] (4) Hot isostatic pressing treatment: the sintered billet is subjected to hot isostatic pressing treatment under an argon atmosphere, the temperature is 1250° C., the pressure is 150 MPa, and the holding time...

Embodiment 3

[0049] (1) Raw material preparation: Mix tungsten powder with a particle size of 2.5 μm and a weight percentage of 76.5%, nickel powder with a particle size of 3.0 μm and a weight percentage of 23.5% in a mixer for 15 hours, and mix them uniformly to obtain a mixed powder for later use ;

[0050] (2) Cold isostatic pressing: put the mixed powder into a soft rubber film, put it into a cold isostatic press and press to form, the isostatic pressure is 200MPa, the holding time is 20 minutes, and the mixed powder is isostatic pressed Finally, a preform with a relative density of 60% is obtained;

[0051] (3) Sintering: Sinter the preform under a hydrogen protective atmosphere, the sintering temperature is 1400°C, and the holding time is 2 hours to obtain a sintered blank;

[0052] (4) Hot isostatic pressing treatment: the sintered billet is subjected to hot isostatic pressing treatment under an argon atmosphere, the temperature is 1100° C., the pressure is 130 MPa, and the holding...

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Abstract

The invention discloses a method for preparing a tungsten-nickel alloy target material and the tungsten-nickel alloy target material prepared by the method. The preparation method of the tungsten-nickel alloy target material includes: raw material preparation step: mixing tungsten powder and nickel powder to obtain mixed powder; press forming step: performing press forming treatment on the mixed powder to obtain a preform; sintering step: Sintering the preform to obtain a sintered billet; hot isostatic pressing treatment step: subjecting the sintered billet to hot isostatic pressing to obtain a hot isostatic pressed billet; heat treatment step: subjecting the hot isostatic pressed billet to Perform heat treatment, and then rapidly cool to obtain a tungsten-nickel alloy target. The invention adopts low-temperature sintering first, and then hot isostatic pressing process for densification treatment. The density of the tungsten-nickel alloy target reaches more than 99.8%, and is isotropic. The average particle size of the tungsten phase is less than 30 microns, which can be widely used in glass coating aspect.

Description

technical field [0001] The invention belongs to the technical field of powder metallurgy of refractory metal materials, and in particular relates to a tungsten-nickel alloy target material and a preparation method thereof. Background technique [0002] Electrochromic smart glass has the ability to adjust light absorption and transmission under the action of an electric field, and can selectively absorb or reflect external heat radiation and internal heat diffusion. It is a development direction of energy-saving building materials. Electrochromic smart glass can adjust the light intensity inside cars and airplanes with low voltage and low power, and has been applied in some high-end cars and airplanes. [0003] Tungsten-nickel alloy targets have been widely used as electrochromic glass sputtering coating targets. The tungsten-nickel alloy target forms a tungsten-nickel alloy oxide layer on the glass surface, and redox reactions occur under the action of voltage, and the color...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/08C23C14/34B22F1/00B22F3/04B22F3/10B22F3/15B22F3/24C22C27/04C22C19/03C03C17/245
CPCB22F1/0003C23C14/08C23C14/0036C23C14/3414C23C14/3407B22F3/04B22F3/1007B22F3/15B22F3/24C22C27/04C22C19/03C03C17/245B22F2003/248B22F2998/10C03C2217/23C03C2217/70C03C2218/154
Inventor 刘桂荣王广达弓艳飞杨林熊宁
Owner 安泰天龙钨钼科技有限公司