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Heterogeneous material structured multilayer film wave absorber and manufacturing method thereof

A technology of multi-layer thin films and heterogeneous materials, applied in metal material coating process, coating, gaseous chemical plating, etc., can solve the problems of large volume and weight of the absorber, narrow bandwidth of the absorber, and high manufacturing cost , to achieve the effects of high manufacturing efficiency, low manufacturing process cost, and reduced volume and weight

Active Publication Date: 2020-04-10
XIAN TECHNOLOGICAL UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The present invention provides a polarization-insensitive heterogeneous material structured multi-layer film absorber and its preparation method to solve the problem of large volume and weight of absorbers based on traditional structural materials and absorbers based on metamaterials. Problems of narrow bandwidth, high manufacturing cost, low efficiency and difficult application

Method used

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  • Heterogeneous material structured multilayer film wave absorber and manufacturing method thereof
  • Heterogeneous material structured multilayer film wave absorber and manufacturing method thereof
  • Heterogeneous material structured multilayer film wave absorber and manufacturing method thereof

Examples

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Embodiment 1

[0025] Such as figure 1 As shown, the present invention provides a heterogeneous material structured multi-layer thin film absorber. This embodiment is a six-layer thin film absorber, including a silicon substrate, and two multi-film layer units are arranged on the top of the silicon substrate, namely metal -Low refractive index layer-high refractive index layer (M-L-H), each multi-film layer unit includes Ag thin film, SiO 2 Thin films and SiN x Thin film, two multi-film layer units as a whole pyramid array structure. The size of the silicon substrate is 4 μm×4 μm, and the height of the pyramid array structure composed of two multi-layer units is 2 μm. The film thickness of each multi-film layer unit is set as follows: figure 1 As shown, the Ag film thickness in the film layer unit is 40nm, and the SiO 2 The thickness of the film is 490nm, SiN x The thickness of the film was 490 nm. Since the thickness of the Ag film on the surface of the substrate is not less than 120n...

Embodiment 2

[0034] Same as Example 1, the absorbing structure of each "metal-low refractive index layer-high refractive index layer (M-L-H)" is designed as a multi-film layer unit. In this embodiment, three multi-film layers are arranged on the top of the silicon substrate Layer unit, the three multi-film layer units are a pyramid array structure as a whole. The size of the silicon substrate is 4 μm×4 μm, and the height of the pyramid array structure composed of three multi-layer units is 1.8 μm. The film thickness of each film unit is set as follows: Ag film thickness is 200nm, SiO 2 The thickness of the film is 200nm, SiN x The thickness of the film is 200nm, as Figure 4 shown.

[0035] The preparation method of said nine-layer film wave absorber comprises the following steps:

[0036] 1. Using magnetron sputtering technology to deposit a metal thin film on the surface of the silicon substrate, and by controlling the deposition time, the thickness of the Ag film is 200nm.

[0037]...

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Abstract

The invention discloses a heterogeneous material structured multilayer film wave absorber and a manufacturing method thereof. A structured multilayer film comprises a silicon substrate, an Ag film, aSiO2 film and a SiNx film which are sequentially stacked from bottom to top, the whole structured multilayer film is a micro-pyramid structure array. During preparation, a single-point diamond turningtechnology is adopted to directly complete forming of the micro-pyramid structure in the heterogeneous material multi-layer thin film. The heterogeneous material structured multilayer film wave absorber provided by the invention shows obvious wave absorbing characteristics on visible light waves and infrared band light waves; the heterogeneous material structured multilayer film wave absorber containing the metal-medium can realize absorption of electromagnetic wave energy, is low in preparation cost and high in efficiency, and has important practical value in the fields of photovoltaics andinvisibility.

Description

technical field [0001] The invention relates to the field of electromagnetic wave absorption, in particular to a heterogeneous material structured multi-layer film wave absorber and a preparation method thereof. Background technique [0002] Absorbing material refers to a class of materials that can effectively absorb and dissipate the energy of electromagnetic waves irradiated on its surface. It is an important functional material. Absorbing materials can be divided into coating type and structure type. Among them, the coated wave-absorbing material is generally made by mixing absorbents such as powder and fiber with wave-absorbing properties with binders and curing agents in a certain proportion. F-117A, B-2, F-22, etc. The fighter plane uses coated absorbing materials on the strong scattering source of the fuselage. The structural absorbing material is a multifunctional composite material. Compared with the coated absorbing material, the biggest advantage of the struct...

Claims

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Application Information

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IPC IPC(8): H01Q17/00C23C14/16C23C14/35C23C16/34C23C16/40
CPCC23C14/165C23C14/35C23C16/345C23C16/402H01Q17/008
Inventor 刘卫国葛少博周顺杨鹏飞李世杰阳志强黄岳田
Owner XIAN TECHNOLOGICAL UNIV
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