In-channel polishing method of microchannel plate

A micro-channel plate, internal polishing technology, applied in electrode system manufacturing, discharge tube/lamp manufacturing, electron multiplier details, etc., can solve the problem of large channel wall roughness, achieve high gain, low noise, cumulative Pick up effects with high charge

Active Publication Date: 2022-04-05
山西长城微光器材股份有限公司
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In order to solve the problem of large channel wall roughness in the novel microchannel plate processing technology, the present invention improves the channel wall processing steps in the microchannel plate processing technology, and provides a polishing method in the channel of the microchannel plate

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • In-channel polishing method of microchannel plate
  • In-channel polishing method of microchannel plate
  • In-channel polishing method of microchannel plate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0027] The present invention will be further described below in conjunction with specific examples.

[0028] A polishing method in the channel of a microchannel plate: the following steps are carried out by using the fabricated microhole array glass blank:

[0029] ① Place the microporous array glass blank in the mixed solution of nitric acid and hydrofluoric acid, and vibrate in the ultrasonic wave for 10-20 minutes;

[0030] ②Replace with a new mixture of nitric acid and hydrofluoric acid, and stir in a magnetic stirrer for 20 to 40 minutes;

[0031] ③Take out the micropore array glass blank from the nitric acid hydrofluoric acid mixture, and then place the micropore array glass blank in pure water for cleaning and changing the water for 8 to 15 times;

[0032] ④ After cleaning, place the microporous array glass blank in a mixture of hydrofluoric acid and sulfuric acid, and stir in a magnetic stirrer for 20 to 40 minutes;

[0033] ⑤ Take out the microporous array glass blank...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
surface roughnessaaaaaaaaaa
Login to view more

Abstract

The invention discloses a polishing method in the channel of a micro-channel plate, which relates to the field of manufacturing optimization of an electron multiplier micro-channel plate. Aiming at the micro-hole array glass blank that has been manufactured by using the traditional process, firstly, the nitric acid-hydrofluoric acid mixed solution is used for polishing. Ultrasonic vibration, and then replace the new nitric acid hydrofluoric acid mixture with a magnetic stirrer for a certain period of time, and use pure water to perform multiple water changes for cleaning; secondly, use a magnetic stirrer for a certain period of time in the hydrofluoric acid + sulfuric acid mixture. Then use pure water for multiple water changes and cleaning; then mix hydrofluoric acid + sulfuric acid + ammonium fluoride, stir in a magnetic stirrer, then use pure water for multiple water changes and cleaning; finally use ethanol solution to clean and put After roasting in a vacuum oven for a certain period of time, the internal polishing of the microchannel is achieved. The internal polishing method provided by the present invention meets the purpose of the ALD process for the roughness of the channel wall. This process avoids damage to the channel wall caused by traditional acid corrosion. Causes issues with launch points.

Description

technical field [0001] The invention relates to the field of manufacturing optimization of an electron multiplier microchannel plate, in particular to a polishing method in a channel of a microchannel plate. Background technique [0002] Microchannel plate (MCP for short) is a fiber array composed of millions of hollow fiber channels, such as figure 1 and figure 2 As shown, when an operating voltage is applied to its input and output surfaces, each channel can use the characteristics of secondary electron emission to achieve multiple multiplications of electrons entering the channel, and millions of channels constitute a two-dimensional continuous electron multiplier array. The multiplication mechanism is that after the lead silicate glass is reduced by hydrogen, a continuous secondary electron emission layer and a semiconductor layer are formed on the surface and subsurface respectively, and the secondary electron emission coefficient is between 2 and 3. Under the actio...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): H01J9/02H01J43/24C03C15/02
CPCH01J9/02H01J43/246C03C15/02
Inventor 李江陈平香栗重浩
Owner 山西长城微光器材股份有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap