Resistance-type flexible pressure sensor and preparation method thereof
A pressure sensor and resistive technology, applied in the field of resistive flexible pressure sensor and its preparation, can solve the problems of difficult control of process parameters, cumbersome steps, many materials, etc., and achieve the effects of low cost, simple process and improved sensitivity
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[0030] The manufacturing method of the resistive flexible pressure sensor provided by the present invention includes:
[0031] S1, providing a first flexible substrate, and using a laser to etch a surface of the first flexible substrate to form microstructures of at least two heights;
[0032] S2, forming a conductive layer on the surface of the first flexible substrate with the microstructure to obtain a first flexible substrate;
[0033] S3, providing a second flexible substrate, wherein the second flexible substrate includes a second flexible substrate and an electrode provided on a surface of the second flexible substrate; and
[0034] S4: Laminating the second flexible substrate on the first flexible substrate, and contacting the electrode with part of the conductive layer to obtain a resistive flexible pressure sensor.
[0035] In step S1, the thickness of the first flexible substrate is 50 μm to 200 μm, and the material of the first flexible substrate is an insulating polymer mat...
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[0079] Example 1:
[0080] (1) Weigh 1g of polydimethylsiloxane (PDMS) prepolymer in a beaker, then weigh 0.1g of curing agent into the beaker and stir evenly, and place it under 0.1 Torr vacuum for 10 minutes to remove bubbles. A clean glass substrate was selected, and the above-mentioned mixture was spin-coated on its surface at a rotation speed of 500 rpm and a time of 10 s, and cured at 60° C. to obtain a first flexible substrate and a second flexible substrate with a thickness of 100 μm.
[0081] (2) A pulsed laser with a wavelength of 355nm and a pulse width of 500fs is used to etch the grid pattern on the surface of the first flexible substrate, the horizontal and vertical grid filling spacing is 20 microns, the laser single pulse energy is 10μJ, and the scanning speed is 500mm / s, three height microstructures are obtained after the etching is completed.
[0082] (3) Prepare the AgNWs ethanol solution with a concentration of 10mg / mL, treat the surface of the microstructure wit...
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