Oxidation-resistant strong-acid-resistant organosilicon compound, and synthesis method and application thereof

A technology of organosilicon compound and synthesis method, which is applied in the field of acid mist suppression to achieve the effect of improving wettability

Active Publication Date: 2020-05-19
GUANGZHOU HKS SURFACE TREATMENT CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Studies have shown that this type of compound also has certain toxicity to organisms, and also has persistence and bioaccumulation

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036] A method for synthesizing an oxidation-resistant and acid-resistant organosilicon compound, comprising the steps of:

[0037] (1) 1.2g chloroplatinic acid hexahydrate (H 2 PtCl 6 ·6H 2 O) join in the 20mL isopropanol, stir, standby as initiator;

[0038] (2) Under nitrogen protection, the following components are added in proportion (mol parts) in the dry reactor:

[0039] (CH 3 ) 3 Si-O-[Si(CH 3 ) 2 -O-] 12 [Si(CH 3 )H-O-] 2 [Si(CH 3 ) 2 -O-] 12 -Si(CH 3 ) 3 100 copies

[0040] CH 2 =CH-(CH 2 ) 10 SO 3 CH 3 26 copies

[0041] Initiator 0.005 part

[0042] The above mixture was fully stirred, and heated to 95°C, and reacted for 1h under stirring. Add 100 parts of 1 mol / L sodium hydroxide solution to the product, heat to 90° C., and react for 0.5 h under vigorous stirring to obtain the oxidation-resistant and strong acid-resistant organosilicon compound.

Embodiment 2

[0044] A method for synthesizing an oxidation-resistant and acid-resistant organosilicon compound, comprising the steps of:

[0045] (1) 1.2g chloroplatinic acid hexahydrate (H 2 PtCl 6 ·6H 2 0) join in 20mL isopropanol, stir well, standby as catalyst;

[0046] (2) The following components are added in proportion (mol parts) to the dry reactor:

[0047] (CH 3 ) 3 Si-O-[Si(CH 3 ) 2 -O] 12 -[Si(CH 3 )H-O] 2 -[O-Si(CH 3 ) 2 -] 12 -O-Si(CH 3 ) 3 100 copies

[0048] CH 2 =CH-(CH 2 ) 10 -(C 6 h 4 )-PO 3 CH 3 26 copies

[0049] Catalyst 0.005 parts

[0050] Note: CH 2 =CH-(CH 2 ) 10 -(C 6 h 4 )-PO 3 CH 3 In, -(C 6 h 4 )- is phenylene.

[0051] The above mixture was fully stirred, and heated to 95°C, and reacted for 1h under stirring. Add 100 parts of 1 mol / L sodium hydroxide solution to the product, heat to 90° C., and react for 0.5 h under vigorous stirring to obtain the oxidation-resistant and strong acid-resistant organosilicon compound.

Embodiment 3

[0053] A method for synthesizing an oxidation-resistant and acid-resistant organosilicon compound, comprising the steps of:

[0054] (1) 1.2g chloroplatinic acid hexahydrate (H 2 PtCl 6 ·6H 2 0) join in 20mL isopropanol, stir well, standby as catalyst;

[0055] (2) The following components are added in proportion (mol parts) to the dry reactor:

[0056] (CH 3 ) 3 Si-O-[Si(CH 3 ) 2 -O] 12 -[Si(CH 3 )H-O] 2 -[O-Si(CH 3 ) 2 -] 12 -O-Si(CH 3 ) 3 100 copies

[0057] CH 2 =CH-(CH 2 ) 10 -C 6 h 10 -C 6 h 4 -COOH (alkenyl substituted cyclohexyl benzoic acid) 37 parts

[0058] Catalyst 0.006 parts

[0059] Note: CH 2 =CH-(CH 2 ) 10 -C 6 h 10 -C 6 h 4 -COOH, C 6 h 10 is cyclohexylene, -C 6 h 4 - is phenylene.

[0060] The above mixture was fully stirred, and heated to 95° C., and reacted for 1 h under stirring to obtain the oxidation-resistant and strong-acid-resistant organosilicon compound.

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PUM

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Abstract

The invention discloses an oxidation-resistant strong-acid-resistant organosilicon compound and a synthesis method and application thereof. The structural formula of the organosilicon compound is shown in the specification: -[Si(CH<3>)<2>-O-]<m>[Si(CH<3>)R-O-]<n>[Si(CH<3>)<2>-O-]<o>-, R is [-CH<2>]-(Ph)<q>SO<3>X, [-CH<2>]-(Ph)<q>PO<3>X,-(CH<2>)-naphthenic group-Ph-COOX or [-CH<2>]-(CO)<q>-CH<3>. According to the invention, polydimethylsiloxane containing silicon-hydrogen bonds is used as a grafting raw material, and acid-resistant and oxidation-resistant hydrophilic groups are grafted on the side chains of polydimethylsiloxane, so that the product achieves the purposes of acid resistance and oxidation resistance, has surface activity, and plays a role in effectively inhibitingacid mist dissipation. Moreover, the organosilicon compound disclosed by the invention belongs to an environment-friendly product, fluorine compounds are not used in synthesis raw materials of the organosilicon compound, forbidden perfluorooctylsulfonic acid compounds are not contained, and degradation products of the organosilicon compound do not contain fluorine elements or highly toxic perfluorooctylsulfonic acid surfactants, so that the organosilicon compound is safe and non-toxic.

Description

technical field [0001] The invention relates to the technical field of acid mist suppression, in particular to an organosilicon compound resistant to oxidation and strong acid, a synthesis method and application thereof. Background technique [0002] In the chromium electroplating process, the roughening process of the plastic electroplating process, and the anodic oxidation process of aluminum alloys, acidic solutions containing strong oxidizing substances such as chromate, dichromate, and permanganate are commonly used, and a large amount of harmful acid mist is easily generated. . This not only causes a lot of waste, but also seriously endangers the health of operators, and also causes corrosion of machines and equipment. Therefore, it is often necessary to add a surfactant resistant to strong acid and oxidation, so that the surface tension of the acid solution is greatly reduced, so as to inhibit the formation of acid mist. [0003] Traditionally, the most commonly use...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08G77/392C08G77/395C08G77/38C25D3/04
CPCC08G77/392C08G77/395C08G77/38C25D3/04
Inventor 贾国梁牛艳丽蔡志华蒲海丽
Owner GUANGZHOU HKS SURFACE TREATMENT CO LTD
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