Ultraviolet lamp ionizing device

An ultraviolet lamp and vacuum ultraviolet lamp technology, applied in the field of mass spectrometry ionization sources, can solve the problems of difficulty in manufacturing and manufacturing cost of light sources, inability to ionize, difficult to apply and popularize, etc., and achieves wide working pressure range, low detection line, and wide range of samples to be tested. Effect

Inactive Publication Date: 2012-05-30
DALIAN INST OF CHEM PHYSICS CHINESE ACAD OF SCI
View PDF5 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The light source used in the current photoelectron ionization source is mostly vacuum ultraviolet light below 200nm, but this vacuum ultraviolet light requires special lens materials, and there is currently no material that can transmit photon energy higher than 12eV, so it is impossible to convert the ionization energy Ionization of species above 12eV
In addition, high-intensity vacuum ultraviolet light sources are difficult to manufacture or have high manufacturing costs, making it difficult to apply and promote

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Ultraviolet lamp ionizing device
  • Ultraviolet lamp ionizing device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] Such as figure 1 As shown, a vacuum ultraviolet lamp ionization device includes an ionization chamber 3, an ultraviolet lamp 1 as a light source is installed above the ionization chamber 3, and a quartz lens 2 is arranged at 1-4 mm below the ultraviolet lamp 1,

[0025] A repelling electrode 5 is arranged at 4 mm directly below the quartz lens 2, and the repelling electrode is a metal disc with a hole in the middle, the aperture is 8 mm, and is coaxial with the quartz lens 2;

[0026] A focus ring 6 is provided at a distance of 10 mm directly below the repulsion electrode 5, the focus ring 6 is a magnetic material with a hole in the middle, the aperture is 8 mm, and is coaxial with the repulsion electrode 5;

[0027] A small hole plate 7 is provided at 4 mm directly below the focus ring 6, the small hole plate 7 is a circular plate with a hole in the middle, the aperture is 1 mm, and is coaxial with the repelling electrode 5;

[0028] Three coaxial lenses 8 are arrange...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses an ultraviolet lamp ionizing device taking photoelectrons as an electron source. The ultraviolet lamp ionizing device comprises an ionizing cavity, an ultraviolet lamp, a repulsion electrode, a focusing ring, an orifice plate, a capillary sample and a lens system. In the invention, the ultraviolet lamp generates photoelectrons on the metal electrode, and then the photoelectrons are accelerated to be collided with molecules of the sample by utilizing an electric field to realize electron ionizing. The ultraviolet lamp ionizing device has the characteristics of wide range of samples to be tested, oxidation resistance, long service life, wide working voltage range and the like so as to have broad application prospect on the aspects of process monitoring and pollutant real-time on-line analysis.

Description

technical field [0001] The invention relates to a mass spectrometer ionization source, which reduces the electron work function by using low electron work function materials, simultaneously uses a high-power ultraviolet light source and an optical focusing lens, and uses a magnetic field to enhance electron collision efficiency, thereby improving photoelectron generation efficiency; The technology has the advantages of low power consumption and resistance to oxidative gases, and is an alternative ionization source for electron impact ionization sources. Background technique [0002] Electron impact ionization (EI) source is the most widely used ionization source in mass spectrometry because of its simplicity and practicality, as well as its rich spectral library. Its basic structure uses a pressurized hot wire as the electron source, and the accelerated electrons ionize neutral molecules in the ionization chamber. However, there are drawbacks to the design of the hot filame...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): H01J49/16
Inventor 李海洋吴庆浩花磊崔华鹏陈平
Owner DALIAN INST OF CHEM PHYSICS CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap